Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7847921 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann +4 more | 2010-12-07 |
| 7808615 | Projection exposure apparatus and method for operating the same | Toralf Gruner, Olaf Conradi, Nils Dieckmann, Markus Schwab, Olaf Dittmann +2 more | 2010-10-05 |
| 7728975 | Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus | Michael Totzeck, Heiko Feldmann, Olaf Dittmann | 2010-06-01 |
| 7710640 | Projection objective of a microlithographic projection exposure apparatus | Susanne Beder, Heiko Feldmann | 2010-05-04 |
| 7697211 | Symmetrical objective having four lens groups for microlithography | David Shafer, Aurelian Dodoc, Johannes Zellner, Heiko Feldmann, Wilhelm Ulrich +3 more | 2010-04-13 |
| 7692868 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Norbert Wabra | 2010-04-06 |
| 7679831 | Projection objective of a microlithographic projection exposure apparatus | Johannes Ruoff | 2010-03-16 |
| 7483121 | Microlithograph system | Wilhelm Ulrich | 2009-01-27 |
| 7463422 | Projection exposure apparatus | Vladimir Kamenow, Michael Totzeck, Toralf Gruner, Aurelian Dodoc, David Shafer +4 more | 2008-12-09 |
| 7463423 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Norbert Wabra | 2008-12-09 |
| 7408616 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann +4 more | 2008-08-05 |
| 7317508 | Optical system and method for the production of micro-structured components by microlithography | Wilhelm Ulrich | 2008-01-08 |
| 7239447 | Objective with crystal lenses | Aksel Goehnermeier, Alexandra Pazidis, Birgit Kuerz, Christoph Zaczek | 2007-07-03 |
| 7239450 | Method of determining lens materials for a projection exposure apparatus | Vladimir Kamenov, Michael Totzeck, Toralf Gruner, Aurelian Dodoc | 2007-07-03 |
| 6992834 | Objective with birefringent lenses | Michael Totzeck, Vladimer Kamenov, Wilhelm Ulrich | 2006-01-31 |
| 6806942 | Projection exposure system | Karl-Heinz Schuster, Wilhelm Ulrich, Toralf Gruner, Wolfgang Singer, Alexander Epple +2 more | 2004-10-19 |