Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11933597 | System and method for optical object coordinate determination | — | 2024-03-19 |
| 10495441 | Probing element and coordinate measuring machine for measuring at least one measurement object | Ferdinand Bader, Dietrich Imkamp | 2019-12-03 |
| 10345570 | Device for optical examination of a specimen, method for examining a specimen and method for transferring a device into an operation-ready state | Wolfgang Singer, Guenter Rudolph, Johannes Ruoff, Christian Dietrich, Rong Dong | 2019-07-09 |
| 10309765 | Coordinate measuring machine having an improved optical sensing system and related method | Dominik Seitz, Frank Widulle, Philipp Jester, Christoph Graf Vom Hagen, Andreas Ebser +1 more | 2019-06-04 |
| 10303068 | Projection exposure tool for microlithography and method for microlithographic imaging | Jochen Hetzler | 2019-05-28 |
| 10209411 | Multilayer mirror | Gisela Von Blanckenhagen | 2019-02-19 |
| 9826201 | Method and measuring machine for determining dimensional properties of a measurement object | Philipp Jester, Frank Widulle | 2017-11-21 |
| 9709902 | Projection exposure tool for microlithography and method for microlithographic imaging | Jochen Hetzler | 2017-07-18 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Frank Schlesener, Ingo Saenger, Olaf Dittmann, Alexandra Pazidis, Thomas Schicketanz +2 more | 2017-02-28 |
| 9442393 | Projection exposure tool for microlithography and method for microlithographic imaging | Jochen Hetzler | 2016-09-13 |
| 9383190 | Measuring apparatus and method for determining dimensional characteristics of a measurement object | David Shafer, Markus Seesselberg, Norbert Kerwien, Thomas Engel | 2016-07-05 |
| 9298097 | Projection exposure apparatus for EUV microlithography and method for microlithographic exposure | Marc Bienert, Heiko Feldmann, Oliver Natt, Johannes Ruoff | 2016-03-29 |
| 9110383 | Projection exposure method and projection exposure system therefor | — | 2015-08-18 |
| 9063439 | Projection objective for microlithography with stray light compensation and related methods | Daniel Kraehmer, Vladimir Kamenov, Michael Totzeck | 2015-06-23 |
| 9046792 | Projection exposure tool for microlithography and method for microlithographic imaging | Jochen Hetzler | 2015-06-02 |
| 9025137 | Method of structuring a photosensitive material | — | 2015-05-05 |
| 8982325 | Microlithographic projection exposure apparatus | Michael Totzeck, Wolfgang Singer, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann +1 more | 2015-03-17 |
| 8767181 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack +4 more | 2014-07-01 |
| 8659745 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering +7 more | 2014-02-25 |
| 8542342 | Method of manufacturing a miniaturized device | Markus Schwab, Toralf Gruner, Tammo Uitterdijk | 2013-09-24 |
| 8542346 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering +7 more | 2013-09-24 |
| 8411356 | Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror | Ralf Mueller, Wolfgang Singer | 2013-04-02 |
| 8358402 | Method of structuring a photosensitive material | — | 2013-01-22 |
| 8339575 | Off-axis objectives with rotatable optical element | Alexandra Pazidis | 2012-12-25 |
| 8325322 | Optical correction device | Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil +7 more | 2012-12-04 |