Issued Patents All Time
Showing 1–25 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12040103 | Imaging optical arrangement to image an object illuminated by X-rays | Johannes Ruoff | 2024-07-16 |
| 11947265 | Optical diffraction component | — | 2024-04-02 |
| 11914303 | Apparatus and method for characterizing a microlithographic mask | Johannes Ruoff, Ulrich Matejka, Thomas Thaler, Sascha Perlitz, Shao-Chi Wei +2 more | 2024-02-27 |
| 11867642 | Inspection device for masks for semiconductor lithography and method | Holger Seitz, Thomas A. Zeuner | 2024-01-09 |
| 11817231 | Detection system for X-ray inspection of an object | Johannes Ruoff, Juan Atkinson Mora, Thomas A. Case, Christoph Graf Vom Hagen, Thomas Matthew Gregorich +1 more | 2023-11-14 |
| 11194256 | Optical diffraction component for suppressing at least one target wavelength by destructive interference | Valentin Jonatan Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop | 2021-12-07 |
| 10928332 | Inspection device for masks for semiconductor lithography and method | Holger Seitz, Thomas A. Zeuner | 2021-02-23 |
| 10852640 | Optical diffraction component for suppressing at least one target wavelength by destructive interference | Valentin Jonatan Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop | 2020-12-01 |
| 10281824 | Microlithography projection objective | Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov +4 more | 2019-05-07 |
| 10274649 | Mirror and related EUV systems and methods | Johannes Ruoff | 2019-04-30 |
| 10114293 | Illumination system and projection objective of a mask inspection apparatus | Erik Matthias Sohmen, Joachim Stuehler, Oswald Gromer, Ulrich Mueller, Michael Layh +1 more | 2018-10-30 |
| 10101668 | Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same | Alexander Epple, Hans-Juergen Rostalski | 2018-10-16 |
| 9733395 | Microlithographic projection exposure apparatus | Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Achim Zirkel +3 more | 2017-08-15 |
| 9658533 | Arrangement of a mirror | Johannes Ruoff, Michael Layh | 2017-05-23 |
| 9651872 | Projection lens with wavefront manipulator | — | 2017-05-16 |
| 9581813 | Method for improving the imaging properties of a projection objective, and such a projection objective | Olaf Conradi, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner +1 more | 2017-02-28 |
| 9568394 | Optical device | Rolf Freimann | 2017-02-14 |
| 9360775 | Method of manufacturing a projection objective and projection objective | Toralf Gruner, Alexander Epple | 2016-06-07 |
| 9298102 | Projection lens with wavefront manipulator | — | 2016-03-29 |
| 9298097 | Projection exposure apparatus for EUV microlithography and method for microlithographic exposure | Marc Bienert, Aksel Goehnermeier, Oliver Natt, Johannes Ruoff | 2016-03-29 |
| 9164396 | Projection lens system of a microlithographic projection exposure installation | Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple +6 more | 2015-10-20 |
| 9158205 | Optical arrangement for three-dimensionally patterning a material layer | — | 2015-10-13 |
| 9104026 | Optical imaging device and imaging method for microscopy | Alexander Epple, Ella Mizkewicz | 2015-08-11 |
| 9097984 | Microlithography projection objective | Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov +4 more | 2015-08-04 |
| 9069263 | Method for improving the imaging properties of a projection objective, and such a projection objective | Olaf Conradi, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner +1 more | 2015-06-30 |