Issued Patents All Time
Showing 1–25 of 127 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12411417 | Projection objective including an optical device | Johannes Lippert, Kerstin Hild, Hans-Michael Stiepan, Thilo Pollak, Jeffrey Cavaco | 2025-09-09 |
| 12339587 | Facet assembly for a facet mirror | Joachim Hartjes, Alexander Wolf | 2025-06-24 |
| 12271117 | Support for an optical element | Joachim Hartjes | 2025-04-08 |
| 12222655 | Stop, optical system and lithography apparatus | Benjahman Julius Modeste, Daniel Golde, Ulrich Loering, Ralf Zweering, Stefan Xalter | 2025-02-11 |
| 12210289 | Mirror, in particular for a microlithographic projection exposure apparatus | Kerstin Hild, Daniel Golde, Hans-Michael Stiepan, Vitaliy Shklover | 2025-01-28 |
| 11927500 | Method and device for characterizing the surface shape of an optical element | Steffen SIEGLER, Johannes Ruoff, Alexander Wolf, Michael Carl, Thomas Schicketanz | 2024-03-12 |
| 11906904 | Projection exposure method and projection lens with setting of the pupil transmission | — | 2024-02-20 |
| 11809085 | Mirror, in particular for a microlithographic projection exposure apparatus | Hans-Michael Stiepan | 2023-11-07 |
| 11415895 | Compensation of creep effects in an imaging device | Marwene Nefzi, Ralf Zweering | 2022-08-16 |
| 11366395 | Mirror, in particular for a microlithographic projection exposure system | Kerstin Hild, Vitaliy Shklover | 2022-06-21 |
| 11360393 | Mirror, in particular for a microlithographic projection exposure system | Ben Wylie-Van Eerd, Frederik Bijkerk, Kerstin Hild, Stefan Schulte, Simone Weyler | 2022-06-14 |
| 11320314 | Method and device for determining the heating state of an optical element in an optical system for microlithography | Joachim Hartjes, Markus Hauf, Gerhard Beurer | 2022-05-03 |
| 11187990 | Mirror for a microlithographic projection exposure apparatus, and method for operating a deformable mirror | Johannes Lippert, Kerstin Hild, Philip Lucke, Mohammadreza Nematollahi | 2021-11-30 |
| 11156922 | Method and device for determining the heating state of a mirror in an optical system | Willem Michiel De Rapper | 2021-10-26 |
| 11143967 | Projection exposure method and projection lens with setting of the pupil transmission | — | 2021-10-12 |
| 11054755 | Optical module with an anticollision device for module components | Joachim Hartjes, Alexander Wolf | 2021-07-06 |
| 11029515 | Optical element, and method for correcting the wavefront effect of an optical element | Kerstin Hild, Vitaliy Shklover | 2021-06-08 |
| 11003088 | Method and device for the correction of imaging defects | Franz Sorg, Peter Deufel | 2021-05-11 |
| 10908509 | Mirror, in particular for a microlithographic projection exposure apparatus | Johannes Lippert, Kerstin Hild | 2021-02-02 |
| 10684466 | Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement | Wouter Bernardus Johannes Hakvoort, Richard Petrus Hogervorst, Petrus Theodorus Rutgers, Kerstin Hild | 2020-06-16 |
| 10620543 | Method and device for the correction of imaging defects | Franz Sorg, Peter Deufel | 2020-04-14 |
| 10591825 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Daniel Golde, Johannes Ruoff, Norbert Wabra, Ricarda Schoemer +1 more | 2020-03-17 |
| 10578976 | Catadioptric projection objective including a reflective optical component and a measuring device | Sascha Bleidistel, Christoph Zaczek, Ralf Mueller | 2020-03-03 |
| 10416569 | Attenuation filter for projection lens, projection lens having attenuation filter for projection exposure apparatus, and projection exposure apparatus having projection lens | Ricarda Schoemer | 2019-09-17 |
| 10345710 | Microlithographic projection exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more | 2019-07-09 |