Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12332576 | Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography | Dirk Heinrich Ehm, Jens Kugler, Benjahman Julius Modeste | 2025-06-17 |
| 12287587 | Damping arrangement for vibration damping of an element in an optical system | Stefan Hembacher, David Schoenen, Jens Kugler | 2025-04-29 |
| 11703770 | Compensation of creep effects in an imaging device | Eylem Bektas Knauf, Ulrich Schoenhoff, Ralf Zweering, Konrad Carl Steimer, Yim-Bun Patrick Kwan | 2023-07-18 |
| 11526089 | Compensation of creep effects in an imaging device | Stefan Hembacher, Stefan Troeger, Ralf Zweering, Konrad Carl Steimer | 2022-12-13 |
| 11415895 | Compensation of creep effects in an imaging device | Ralf Zweering, Toralf Gruner | 2022-08-16 |
| 10989897 | Optical element for the beam guidance of imaging light in projection lithography | Stefan Hembacher | 2021-04-27 |
| 10809636 | Optical arrangement, in particular lithography system | Bernhard Gellrich, Ralf Zweering, Charles Seviour, Michael Erath, Jens Prochnau +3 more | 2020-10-20 |
| 10761436 | Optical arrangement, in particular lithography system, with a transport lock | Ralf Zweering, Steffen Fritzsche, Hendrik Wagner, Florian Ahles, Jens Prochnau +2 more | 2020-09-01 |
| 10416570 | Optical imaging arrangement with a piezoelectric device | Jens Kugler, Stefan Hembacher, Michaela Schmid, Bernhard Geuppert, Burkhard Corves +5 more | 2019-09-17 |
| 10095126 | Moveably mounted component of projection exposure system, as well as device and method for movement limitation for same | Jens Prochnau, Dirk Schaffer | 2018-10-09 |
| 9632421 | Arrangement and lithography apparatus with arrangement | Jens Prochnau | 2017-04-25 |