Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12332576 | Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography | Jens Kugler, Benjahman Julius Modeste, Marwene Nefzi | 2025-06-17 |
| 12306551 | Projection exposure apparatus having a device for determining the concentration of atomic hydrogen | Moritz Becker | 2025-05-20 |
| 12287588 | Method for operating an EUV lithography apparatus, and EUV lithography apparatus | Moritz Becker | 2025-04-29 |
| 12140877 | Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus | Wilbert KRUITHOF, Timo Laufer | 2024-11-12 |
| 11199363 | Method for removing a contamination layer by an atomic layer etching process | Fred Roozeboom, Andrea Illiberi, Moritz Becker, Edwin Te Sligte, Yves Lodewijk Maria Creijghton | 2021-12-14 |
| 11022893 | Optical assembly with a protective element and optical arrangement therewith | Stefan Schmidt | 2021-06-01 |
| 10712677 | Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning | Irene Ament, Stefan Schmidt, Moritz Becker, Stefan Wiesner, Diana Urich | 2020-07-14 |
| 10690812 | Optical element and optical system for EUV lithography, and method for treating such an optical element | Hermanus Hendricus Petrus Theodorus Bekman, Jeroen Huijbregtse, Arnoldus Jan Storm, Tina Graber, Irene Ament +3 more | 2020-06-23 |
| 10649340 | Reflective optical element for EUV lithography | Vitaliy Shklover, Irene Ament, Stefan Schmidt, Moritz Becker, Stefan Wiesner +6 more | 2020-05-12 |
| 10073361 | EUV lithography system and operating method | Stefan Schmidt, Edgar Osorio, Edwin Te Sligte, Mark Zellenrath, Hella Logtenberg | 2018-09-11 |
| 10061205 | Reflective optical element | Moritz Becker, Irene Ament, Gisela Von Blanckenhagen, Joern WEBER | 2018-08-28 |
| 9996005 | Reflective optical element and optical system for EUV lithography | Peter Huber, Stephan Muellender, Gisela Von Blanckenhagen | 2018-06-12 |
| 9880476 | Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatus | Gisela Von Blanckenhagen | 2018-01-30 |
| 9632436 | Optical assembly with suppression of degradation | Stefan Schmidt, Markus Walter | 2017-04-25 |
| 9354529 | Arrangement for use in a projection exposure tool for microlithography having a reflective optical element | Maarten Van Kampen, Stefan Schmidt, Vadim Yevgenyevich Banine, Erik Roelof Loopstra | 2016-05-31 |
| 9341756 | Method for correcting the surface form of a mirror | Juergen Mueller, Thomas Schicketanz | 2016-05-17 |
| 9298109 | EUV lithography apparatus and method for detecting particles in an EUV lithography apparatus | Vera Butscher | 2016-03-29 |
| 9249501 | Surface correction on coated mirrors | Franz-Josef Stickel, Juergen Mueller | 2016-02-02 |
| 9229331 | EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating method | Gisela Von Blanckenhagen | 2016-01-05 |
| 9046794 | Cleaning module, EUV lithography device and method for the cleaning thereof | Stefan Hembacher, Dieter Kraus, Stefan Schmidt, Stefan Koehler, Almut Czap +2 more | 2015-06-02 |
| 9041905 | Optical arrangement, in particular in a projection exposure apparatus for EUV lithography | Stefan Schmidt, Guenther Dengel | 2015-05-26 |
| 8980009 | Method for removing a contamination layer from an optical surface and arrangement therefor | Arnold Storm, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Thomas Stein, Edwin Te Sligte | 2015-03-17 |
| 8953145 | Detection of contaminating substances in an EUV lithography apparatus | Dieter Kraus, Stefan Schmidt | 2015-02-10 |
| 8928855 | Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor | Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn | 2015-01-06 |
| 8885141 | EUV lithography device and method for processing an optical element | Wolfgang Singer, Yim-Bun Patrick Kwan, Stefan Schmidt, Dieter Kraus, Stefan Wiesner +3 more | 2014-11-11 |