| 12332570 |
Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris |
Ronald Peter Albright, Kursat Bal, Vadim Yevgenyevich Banine, Richard Joseph Bruls, Sjoerd Frans DE VRIES +13 more |
2025-06-17 |
| 12174552 |
Lithographic apparatus and electrostatic clamp designs |
Victor Antonio PEREZ-FALCON, Marcus Adrianus Van De Kerkhof, Daniel Leslie Hall, Christopher Mason, Arthur Winfried Eduardus Minnaert +1 more |
2024-12-24 |
| 12117736 |
Lithographic apparatus |
Marcus Adrianus Van De Kerkhof, Satish Achanta, Vadim Yevgenyevich Banine, Stef Marten Johan Janssens, Andrey Nikipelov |
2024-10-15 |
| 11846887 |
Prolonging optical element lifetime in an EUV lithography system |
Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel +20 more |
2023-12-19 |
| 11340532 |
Prolonging optical element lifetime in an EUV lithography system |
Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel +20 more |
2022-05-24 |
| 11294291 |
Lithographic apparatus |
Marcus Adrianus Van De Kerkhof |
2022-04-05 |
| 10310394 |
Lithographic apparatus, a projection system and a device manufacturing method |
Yuri Johannes Gabriël Van De Vijver, Wendelin Johanna Maria Versteeg, Peter Gerardus Jonkers |
2019-06-04 |
| 10222702 |
Radiation source |
Arno Jan Bleeker, Ramon Mark Hofstra, Erik Petrus Buurman, Alexander Matthijs Struycken, Harm-Jan Voorma +3 more |
2019-03-05 |
| 10001709 |
Lithographic apparatus, spectral purity filter and device manufacturing method |
Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin +2 more |
2018-06-19 |
| 9897930 |
Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical element |
Leonid Aizikovitch Sjmaenok, Vadim Yevgenyevich Banine, Denis Alexandrovich Glushkov, Andrei Mikhailovich Yakunin |
2018-02-20 |
| 9632419 |
Radiation source |
Jan Bernard Plechelmus Van Schoot, Vadim Yevgenyevich Banine, Olav Waldemar Vladimir Frijns, Hermanus Johannes Maria Kreuwel, Uwe Stamm +3 more |
2017-04-25 |
| 9594306 |
Lithographic apparatus, spectral purity filter and device manufacturing method |
Vadim Yevgenyevich Banine, Wilhelmus Petrus De Boeij, Antonius Johannes Josephus Van Dijsseldonk, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot +2 more |
2017-03-14 |
| 9529283 |
Radiation source, lithographic apparatus, and device manufacturing method |
Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Leonid Aizikovitch Sjmaenok |
2016-12-27 |
| 9411238 |
Source-collector device, lithographic apparatus, and device manufacturing method |
Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns +5 more |
2016-08-09 |
| 9363879 |
Module and method for producing extreme ultraviolet radiation |
Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot +4 more |
2016-06-07 |
| 9207548 |
Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method |
Vadim Yevgenyevich Banine, Erik Roelof Loopstra |
2015-12-08 |
| 9164403 |
Radiation source, lithographic apparatus and device manufacturing method |
Antonius Theodorus Wilhelmus Kempen, Richard Joseph Bruls, Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Wilbert Jan Mestrom |
2015-10-20 |
| 8980009 |
Method for removing a contamination layer from an optical surface and arrangement therefor |
Dirk Heinrich Ehm, Arnold Storm, Bastiaan Theodoor Wolschrijn, Thomas Stein, Edwin Te Sligte |
2015-03-17 |
| 8946661 |
Radiation source, lithographic apparatus and device manufacturing method |
Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Vadim Yevgenyevich Banine |
2015-02-03 |
| 8928855 |
Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor |
Bastiaan Theodoor Wolschrijn, Dirk Heinrich Ehm |
2015-01-06 |
| 8901521 |
Module and method for producing extreme ultraviolet radiation |
Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot +4 more |
2014-12-02 |
| 8610089 |
Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method |
Sjoerd Nicolaas Lambertus Donders, Vadim Yevgenyevich Banine, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Gerrit Van Donk +1 more |
2013-12-17 |
| 8585224 |
Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination |
Dirk Heinrich Ehm, Stephan Muellender, Thomas Stein, Bastiaan Theodoor Wolschrijn, Dieter Kraus +2 more |
2013-11-19 |
| 8547551 |
Lithographic apparatus and contamination detection method |
Anastasius Jacobus Anicetus Bruinsma, Lucas Henricus Johannes Stevens, Abraham Veefkind, Peter Gerhardus Wilhelmus Bussink, Egbert Anne Martijn Brouwer |
2013-10-01 |
| 8507882 |
Radiation source and lithographic apparatus |
Gerardus Hubertus Petrus Maria Swinkels, Vadim Yevgenyevich Banine, Erik Roelof Loopstra |
2013-08-13 |
