HW

Hubertus Johannes Van De Wiel

AB Asml Netherlands B.V.: 3 patents #1,156 of 3,192Top 40%
📍 's-Hertogenbosch, NL: #70 of 252 inventorsTop 30%
Overall (All Time): #1,405,443 of 4,157,543Top 35%
3
Patents All Time

Issued Patents All Time

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
11846887 Prolonging optical element lifetime in an EUV lithography system Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers +20 more 2023-12-19
11340532 Prolonging optical element lifetime in an EUV lithography system Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers +20 more 2022-05-24
9192039 Radiation source Antonius Theodorus Wilhelmus Kempen, Erik Roelof Loopstra, Corne Rentrop, Dennis De Graaf, Frits Gubbels +1 more 2015-11-17