JR

Jeroen Hubert Rommers

AB Asml Netherlands B.V.: 3 patents #1,156 of 3,192Top 40%
📍 Lommel, BE: #19 of 59 inventorsTop 35%
Overall (All Time): #1,405,444 of 4,157,543Top 35%
3
Patents All Time

Issued Patents All Time

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
11846887 Prolonging optical element lifetime in an EUV lithography system Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Hubertus Johannes Van De Wiel +20 more 2023-12-19
11340532 Prolonging optical element lifetime in an EUV lithography system Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Hubertus Johannes Van De Wiel +20 more 2022-05-24
8435593 Method of inspecting a substrate and method of preparing a substrate for lithography Rik Teodoor Vangheluwe, Youri Johannes Laurentius Maria Van Dommelen, Johannes Anna Quaedackers, Cédric Désiré Grouwstra, Thijs Egidius Johannes Knaapen +1 more 2013-05-07