JM

Johannes Hubertus Josephina Moors

AB Asml Netherlands B.V.: 89 patents #21 of 3,192Top 1%
CG Carl Zeiss Smt Gmbh: 11 patents #135 of 1,189Top 15%
AN Asml Holding N.V.: 2 patents #214 of 520Top 45%
U.S. Philips: 1 patents #4,133 of 8,851Top 50%
📍 Roosteren, NL: #1 of 4 inventorsTop 25%
Overall (All Time): #17,127 of 4,157,543Top 1%
92
Patents All Time

Issued Patents All Time

Showing 26–50 of 92 patents

Patent #TitleCo-InventorsDate
8477285 Particle cleaning of optical elements for microlithography Dirk Heinrich Ehm, Arnoldus Jan Storm, Almut Czap, Mona Nagel, Jacques Cor Johan Van Der Donck +4 more 2013-07-02
8476167 Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus Hubert Adriaan Van Mierlo, Erik Ham, Hendricus Johannes Maria Meijer, Hendrik Antony Johannes Neerhof, Joost Jeroen Ottens +3 more 2013-07-02
8446560 Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method Norbertus Benedictus Koster, Erik R. Loopstra, Martin Frans Pierre Smeets, Antonius Theodorus Wilhelmus Kempen 2013-05-21
8445873 System and method for detecting at least one contamination species in a lithographic apparatus Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Ralph Kurt, Lucas Henricus Johannes Stevens, Peter Cornelis Zalm 2013-05-21
8405055 Source module, radiation source and lithographic apparatus Dzmitry Labetski, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels 2013-03-26
8382301 Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination Dirk Heinrich Ehm, Stephan Muellender, Thomas Stein, Bastiaan Theodoor Wolschrijn, Dieter Kraus +2 more 2013-02-26
8368040 Radiation system and lithographic apparatus Erik Roelof Loopstra, Vladimir Vitalevich Ivanov, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin, Dennis De Graaf +1 more 2013-02-05
8345223 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby Wouter Anthon Soer, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Andrei Mikhailovich Yakunin 2013-01-01
8317929 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus Tatyana Victorovna Rakhimova, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Konstantin Nikolaevitch Koshelev, Aleksander Sergeevich Kovalev +1 more 2012-11-27
8279397 Method for removing contamination on optical surfaces and optical arrangement Dirk Heinrich Ehm, Bastiaan Theodoor Wolschrijn, Vadim Yevgenyevich Banine, Vladimir Vitalevitsch Ivanov 2012-10-02
8269179 Illumination system and filter system Arnoud Cornelis Wassink, Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans 2012-09-18
8217347 System and method for detecting at least one contamination species in a lithographic apparatus Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Ralph Kurt, Lucas Henricus Johannes Stevens, Peter Cornelis Zalm 2012-07-10
8094288 Lithographic apparatus and device manufacturing method Vadim Yevgenyevich Banine 2012-01-10
7959310 Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element Dirk Heinrich Ehm, Annemieke Van De Runstraat, Bastiaan Theodoor Wolschrijn, Arnoldus Jan Storm, Thomas Stein +8 more 2011-06-14
7935218 Optical apparatus, lithographic apparatus and device manufacturing method Vadim Yevgenyevich Banine, Bastiaan Theodoor Wolschrijn, Carolus Ida Maria Antonius Spee, Rik Jansen 2011-05-03
7928412 Lithographic apparatus, and device manufacturing method Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Johannes Peterus Henricus De Kuster, Lucas Henricus Johannes Stevens, Bastiaan Theodoor Wolschrijn +5 more 2011-04-19
7897110 System and method for detecting at least one contamination species in a lithographic apparatus Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Ralph Kurt, Lucas Henricus Johannes Stevens, Peter Cornelis Zalm 2011-03-01
7868304 Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Carolus Ida Maria Antonius Spee, Johannes Christiaan Leonardus Franken, Arnoud Cornelis Wassink +1 more 2011-01-11
7816658 Extreme ultra-violet lithographic apparatus and device manufacturing method Jan Bernard Plechelmus Van Schoot 2010-10-19
7812330 Radical cleaning arrangement for a lithographic apparatus Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Bastiaan Theodoor Wolschrijn, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen 2010-10-12
7800079 Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Lucas Henricus Johannes Stevens, Yurii Victorvitch Sidelnikov, Marcel Mathijs Theodore Marie Dierichs +1 more 2010-09-21
7763870 Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements Dirk Heinrich Ehm, Hermann Bieg, Hans-Juergen Mann, Stephan Muellender, Bastiaan Theodoor Wolschrijn 2010-07-27
7714306 Lithographic apparatus and device manufacturing method Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans 2010-05-11
7684012 Lithographic device, device manufacturing method and device manufactured thereby Johannes Henricus Wilhelmus Jacobs, Vadim Yevgenyevich Banine, Barrie Dudley Brewster, Vladimir Vitalevitch Ivanov, Bastiaan Mertens +2 more 2010-03-23
7671347 Cleaning method, apparatus and cleaning system Dirk Heinrich Ehm, Bastiaan Theodoor Wolschrijn, Marcus Gerhardus Hendrikus Meijerink, Thomas Stein 2010-03-02