SH

Stefan Hembacher

CG Carl Zeiss Smt Gmbh: 29 patents #39 of 1,189Top 4%
AB Asml Netherlands B.V.: 5 patents #820 of 3,192Top 30%
Overall (All Time): #127,862 of 4,157,543Top 4%
29
Patents All Time

Issued Patents All Time

Showing 1–25 of 29 patents

Patent #TitleCo-InventorsDate
12287587 Damping arrangement for vibration damping of an element in an optical system Marwene Nefzi, David Schoenen, Jens Kugler 2025-04-29
11526089 Compensation of creep effects in an imaging device Marwene Nefzi, Stefan Troeger, Ralf Zweering, Konrad Carl Steimer 2022-12-13
11281114 Projection exposure apparatus for semiconductor lithography Jens Kugler, Mark Feygin, Stefan Xalter, Bernhard Gellrich 2022-03-22
11169359 Method for positioning a component of an optical system Pascal Marsollek 2021-11-09
11092897 Method for producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithography 2021-08-17
10989897 Optical element for the beam guidance of imaging light in projection lithography Marwene Nefzi 2021-04-27
10890850 Optical imaging arrangement with actively adjustable metrology support units Bernhard Geuppert, Jens Kugler 2021-01-12
10684551 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2020-06-16
10599051 Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus Erik Loopstra, Jens Kugler, Bernhard Geuppert 2020-03-24
10416570 Optical imaging arrangement with a piezoelectric device Jens Kugler, Michaela Schmid, Bernhard Geuppert, Burkhard Corves, Martin Riedel +5 more 2019-09-17
10317802 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2019-06-11
10031423 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2018-07-24
9904175 EUV imaging apparatus Jens Kugler, Michaela Schmid 2018-02-27
9817322 Optical imaging device and method for reducing dynamic fluctuations in pressure difference Bernhard Gellrich, Jens Kugler, Sascha Bleidistel 2017-11-14
9810996 Optical imaging device with thermal attenuation Bernhard Gellrich, Jens Kugler, Thomas Ittner, Karl-Heinz Schimitzek, Payam Tayebati +1 more 2017-11-07
9766550 Actuators and microlithography projection exposure systems and methods using the same Ulrich Weber, Armin Schoeppach 2017-09-19
9746778 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2017-08-29
9696518 Position manipulator for an optical component 2017-07-04
9316929 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2016-04-19
9250417 Optical arrangement in a microlithographic projection exposure apparatus Dirk Schaffer, Jens Kugler 2016-02-02
9175948 Optical module with a measuring device Armin Schoeppach, Guido Limbach, Jens Kugler 2015-11-03
9046794 Cleaning module, EUV lithography device and method for the cleaning thereof Dieter Kraus, Dirk Heinrich Ehm, Stefan Schmidt, Stefan Koehler, Almut Czap +2 more 2015-06-02
8902401 Optical imaging device with thermal attenuation Bernhard Gellrich, Jens Kugler, Thomas Ittner, Karl-Heinz Schimitzek, Payam Tayebati +1 more 2014-12-02
8659745 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering +7 more 2014-02-25
8542346 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering +7 more 2013-09-24