Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12321105 | Projection exposure apparatus for semiconductor lithography | Michael Robert Stolz | 2025-06-03 |
| 12321106 | Device for detecting a temperature, installation for producing an optical element and method for producing an optical element | Michael Robert Stolz | 2025-06-03 |
| 12140877 | Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus | Dirk Heinrich Ehm, Wilbert KRUITHOF | 2024-11-12 |
| 11372341 | Method for temperature control of a component | Joeri Lof, Harmen Krediet | 2022-06-28 |
| 11187989 | Method for determining properties of an EUV source | Markus Hauf, Ulrich Mueller | 2021-11-30 |
| 11022903 | Method for temperature control of a component | Joeri Lof, Harmen Krediet | 2021-06-01 |
| 10684551 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Peter Kuerz +7 more | 2020-06-16 |
| 10466598 | Projection exposure apparatus for semiconductor lithography with increased thermal robustness | Alireza AKBARINIA, Alexandre Kemp, Amishkumar Panchal | 2019-11-05 |
| 10317802 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Peter Kuerz +7 more | 2019-06-11 |
| 10031423 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Peter Kuerz +7 more | 2018-07-24 |
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Peter Kuerz +7 more | 2017-08-29 |
| 9639007 | Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus | Alexander Sauerhoefer | 2017-05-02 |
| 9383328 | Lithography apparatus | — | 2016-07-05 |
| 9316929 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Peter Kuerz +7 more | 2016-04-19 |
| 9134504 | Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus | Alexander Sauerhoefer | 2015-09-15 |
| 8698999 | Protection module for EUV lithography apparatus, and EUV lithography apparatus | Dirk Heinrich Ehm, Ben Banney, Jens Kugler, Ulrich Nieken, Franz Keller | 2014-04-15 |
| 8339569 | Temperature-control device for an optical assembly | Armin Schoeppach | 2012-12-25 |
| 7557902 | Projection objective | Udo Dinger, Frank Eisert, Stefan Koehler, Andreas Ochse, Johannes Zellner +1 more | 2009-07-07 |
| 7524072 | Optical component, comprising a material with a predetermined homogeneity of thermal expansion | Johannes Zellner | 2009-04-28 |
| 7428037 | Optical component that includes a material having a thermal longitudinal expansion with a zero crossing | Jean-Noel Fehr, Harald Kirchner, Andreas Ochse | 2008-09-23 |