Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10684551 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2020-06-16 |
| 10317802 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2019-06-11 |
| 10031423 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2018-07-24 |
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2017-08-29 |
| 9671703 | Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement | Toralf Gruner, Ulrich Loering | 2017-06-06 |
| 9575224 | Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective | Rolf Freimann, Guido Limbach, Thure Boehm, Gero Wittich | 2017-02-21 |
| 9316929 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2016-04-19 |
| 9207541 | Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus | Markus Hauf, Holger Walter, Joachim Hartjes | 2015-12-08 |
| 9201226 | Imaging optics | Ulrich Loering, Ralf Mueller, Hans-Juergen Mann | 2015-12-01 |
| 5412207 | Method and apparatus for analyzing a gas sample | Alexander J. Micco, Donald G. Ellis | 1995-05-02 |
| 4993725 | Unitary skate assembly having vertical spring means | Frank S. Barnes | 1991-02-19 |