Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12339587 | Facet assembly for a facet mirror | Alexander Wolf, Toralf Gruner | 2025-06-24 |
| 12271117 | Support for an optical element | Toralf Gruner | 2025-04-08 |
| 11467500 | Optical arrangement and method for repairing the optical arrangement after a shock load | — | 2022-10-11 |
| 11320314 | Method and device for determining the heating state of an optical element in an optical system for microlithography | Toralf Gruner, Markus Hauf, Gerhard Beurer | 2022-05-03 |
| 11307503 | Support of an optical unit | Martin Vogt | 2022-04-19 |
| 11137687 | Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma | Bjoern Liebaug, Moritz Becker, Kerstin Hild, Simon Haas | 2021-10-05 |
| 11054755 | Optical module with an anticollision device for module components | Alexander Wolf, Toralf Gruner | 2021-07-06 |
| 10613443 | Optical system, lithography apparatus and method | — | 2020-04-07 |
| 10288894 | Optical component for use in a radiation source module of a projection exposure system | Michael Patra, Alexander Wolf, Markus Schwab, Toralf Gruner | 2019-05-14 |
| 10162267 | Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations | Toralf Gruner, Sascha Bleidistel, Alexander Wolf, Markus Schwab, Markus Hauf | 2018-12-25 |
| 10162270 | Projection exposure apparatus comprising a measuring system for measuring an optical element | Sascha Bleidistel, Toralf Gruner | 2018-12-25 |
| 10146138 | Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus | Kerstin Hild, Franz-Josef Stickel, Robert Fichtl | 2018-12-04 |
| 10012911 | Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator | Michael Arnz, Sascha Bleidistel, Toralf Gruner, Markus Schwab | 2018-07-03 |
| 9846375 | Lithography apparatus with segmented mirror | — | 2017-12-19 |
| 9759550 | Projection exposure apparatus for microlithography comprising an optical distance measurement system | Alexander Wolf, Markus Schwab, Toralf Gruner | 2017-09-12 |
| 9684243 | Blocking element for protecting optical elements in projection exposure apparatuses | Bernhard Sitek, Guenther Dengel, Maik-René Piatkowski | 2017-06-20 |
| 9671584 | Method and cooling system for cooling an optical element for EUV applications | Guenther Dengel | 2017-06-06 |
| 9599910 | Facet mirror device | — | 2017-03-21 |
| 9500957 | Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus | — | 2016-11-22 |
| 9482959 | EUV microlithography illumination optical system and EUV attenuator for same | Nicolas Schmidts, Ulrich Bingel, Boaz Pnini-Mittler | 2016-11-01 |
| 9465208 | Facet mirror device | Martin Vogt | 2016-10-11 |
| 9423590 | Liquid cooled EUV reflector | Damian Fiolka, Boaz Pnini-Mittler | 2016-08-23 |
| 9207541 | Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus | Markus Hauf, Norman Baer, Holger Walter | 2015-12-08 |
| 9134501 | Optical element unit and method of supporting an optical element | Dirk Schaffer, Willi Heintel, Hagen Federau, Harald Kirchner | 2015-09-15 |
| 9063336 | Optical element having a plurality of reflective facet elements | Marc Kirch, Martin Endres, Damian Fiolka | 2015-06-23 |