Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10113864 | Method for determining the registration of a structure on a photomask and apparatus to perform the method | Dirk Seidel, Gerd Klose | 2018-10-30 |
| 10012911 | Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator | Sascha Bleidistel, Toralf Gruner, Joachim Hartjes, Markus Schwab | 2018-07-03 |
| 9797805 | Test object for measuring the point spread function of an optical system | Lars Stoppe, Robert Pomraenke | 2017-10-24 |
| 9786046 | Method and device for determining a lateral offset of a pattern on a substrate relative to a desired position | Dirk Seidel | 2017-10-10 |
| 9377415 | Measuring device for measuring an illumination property | Markus Deguenther | 2016-06-28 |
| 9303975 | Method for determining the registration of a structure on a photomask and apparatus to perform the method | Dirk Seidel, Gerd Klose | 2016-04-05 |
| 9297994 | Grating-assisted autofocus device and autofocusing method for an imaging device | Sascha Perlitz, Dirk Seidel | 2016-03-29 |
| 9229209 | Autofocus device and autofocusing method for an imaging device | Mikhail Levtonov, Gerd Klose, Volkmar Betz | 2016-01-05 |
| 9014505 | Method and device for determining the position of a first structure relative to a second structure or a part thereof | — | 2015-04-21 |
| 8731273 | Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section | Dirk Beyer, Wolfgang Harnisch, Thomas Scheruebl | 2014-05-20 |
| 8694929 | Method and apparatus for the position determination of structures on a mask for microlithography | Dirk Seidel | 2014-04-08 |
| 8693805 | Determination of the relative position of two structures | Dirk Seidel | 2014-04-08 |
| 8473237 | Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage | Alexander Huebel, Matthias Manger, Gerd Klose, Uwe Schellhorn | 2013-06-25 |
| 8457411 | Method and device for determining the position of an edge of a marker structure with subpixel accuracy in an image, having a plurality of pixels, of the marker structure | — | 2013-06-04 |
| 8369605 | Method and apparatus for determining the position of a structure on a carrier relative to a reference point of the carrier | Gerd Klose, Michael Totzeck | 2013-02-05 |
| 8260033 | Method and apparatus for determining the relative overlay shift of stacked layers | Gerd Klose | 2012-09-04 |
| 8218148 | Method and apparatus for measuring scattered light on an optical system | — | 2012-07-10 |
| 7755748 | Device and method for range-resolved determination of scattered light, and an illumination mask | Oswald Gromer, Gerd Klose, Joachim Stuehler, Matthias Manger | 2010-07-13 |
| 7408631 | Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask | Oswald Gromer, Gerd Klose, Joachim Stuehler, Matthias Manger | 2008-08-05 |
| 6816247 | Moiré method and a system for measuring the distortion of an optical imaging system | Joachim Heppner, Juergen Massig, Michael Kuechel, Juergen Penzing, Uwe Schellhorn | 2004-11-09 |