Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12307334 | Method and device for evaluating a statistically distributed measured value in the examination of an element of a photolithography process | Alexander Freytag, Christian Wojek, Susanne Töpfer, Carsten Schmidt, Christoph Husemann | 2025-05-20 |
| 12111579 | Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process | Alexander Freytag, Christoph Husemann, Carsten Schmidt | 2024-10-08 |
| 12001145 | Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model | Alexander Freytag, Christoph Husemann, Carsten Schmidt, Thomas Scheruebl | 2024-06-04 |
| 11947185 | Autofocusing method for an imaging device | — | 2024-04-02 |
| 11892769 | Method for detecting an object structure and apparatus for carrying out the method | Beat Marco Mout, Christoph Husemann, Ulrich Matejka | 2024-02-06 |
| 11774859 | Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process | Alexander Freytag, Christoph Husemann, Carsten Schmidt | 2023-10-03 |
| 11631168 | Method, computer program and apparatus for determining a quality of a mask of a photolithography apparatus | Tom Moebert, Carsten Schmidt, Konrad Schoebel | 2023-04-18 |
| 11243392 | Method for determining an imaging function of a mask inspection microscope, and mask inspection microscope | — | 2022-02-08 |
| 11079586 | Measuring microscope for measuring masks for lithographic methods and measuring method and calibration method therefor | Oliver Jäckel, Carola Bläsing-Bangert | 2021-08-03 |
| 10599936 | Method for correcting the distortion of a first imaging optical unit of a first measurement system | Carsten Schmidt, Michael Himmelhaus | 2020-03-24 |
| 10585274 | Method for capturing and compensating ambient effects in a measuring microscope | Carola Blaesing-Bangert, Oliver Jaeckel | 2020-03-10 |
| 10380733 | Method and apparatus for determining the position of structure elements of a photolithographic mask | Steffen Steinert | 2019-08-13 |
| 10113864 | Method for determining the registration of a structure on a photomask and apparatus to perform the method | Michael Arnz, Gerd Klose | 2018-10-30 |
| 10108085 | Method for localizing defects on substrates | Jan Hendrik Peters, Jörg Frederik Blumrich, Christoph Husemann | 2018-10-23 |
| 10089733 | Method for determining a position of a structure element on a mask and microscope for carrying out the method | — | 2018-10-02 |
| 9786046 | Method and device for determining a lateral offset of a pattern on a substrate relative to a desired position | Michael Arnz | 2017-10-10 |
| 9785058 | Method for ascertaining distortion properties of an optical system in a measurement system for microlithography | Susanne Toepfer, Michael Himmelhaus | 2017-10-10 |
| 9303975 | Method for determining the registration of a structure on a photomask and apparatus to perform the method | Michael Arnz, Gerd Klose | 2016-04-05 |
| 9297994 | Grating-assisted autofocus device and autofocusing method for an imaging device | Sascha Perlitz, Michael Arnz | 2016-03-29 |
| 8693805 | Determination of the relative position of two structures | Michael Arnz | 2014-04-08 |
| 8694929 | Method and apparatus for the position determination of structures on a mask for microlithography | Michael Arnz | 2014-04-08 |