Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11914303 | Apparatus and method for characterizing a microlithographic mask | Johannes Ruoff, Heiko Feldmann, Thomas Thaler, Sascha Perlitz, Shao-Chi Wei +2 more | 2024-02-27 |
| 11892769 | Method for detecting an object structure and apparatus for carrying out the method | Beat Marco Mout, Dirk Seidel, Christoph Husemann | 2024-02-06 |
| 11796563 | Apparatus and method for a scanning probe microscope | Christof Baur | 2023-10-24 |
| 11619882 | Method and apparatus for characterizing a microlithographic mask | Holger Seitz, Thomas Frank, Asad Rasool | 2023-04-04 |
| 11237185 | Apparatus and method for a scanning probe microscope | Christof Baur | 2022-02-01 |
| 11112702 | Device and method for characterizing a microlithographic mask | Sven Martin, Thomas Frank | 2021-09-07 |
| 11079338 | Method for detecting a structure of a lithography mask and device for carrying out the method | Thomas Scheruebl, Markus Koch, Christoph Husemann, Lars Stoppe, Beat Marco Mout | 2021-08-03 |
| 11029259 | Detection device for detecting a structure on an area portion of a lithography mask, and apparatus comprising a detection device of this type | Sven Martin | 2021-06-08 |
| 10698318 | Method and device for characterizing a mask for microlithography | Holger Seitz, Ute Buttgereit, Thomas Thaler, Thomas Frank, Markus Deguenther +2 more | 2020-06-30 |
| 10634886 | Method for three-dimensionally measuring a 3D aerial image of a lithography mask | Christoph Husemann, Johannes Ruoff, Sascha Perlitz, Hans-Jurgen Mann | 2020-04-28 |
| 10606048 | Imaging optical unit for a metrology system for examining a lithography mask | Johannes Ruoff, Ralf Müller, Susanne Beder, Hans-Jurgen Mann, Jens Timo Neumann | 2020-03-31 |
| 10578881 | Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit | Thomas Frank, Dirk Doering, Holger Seitz, Mario Laengle | 2020-03-03 |
| 10168539 | Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit | Thomas Frank, Dirk Doering, Holger Seitz, Mario Laengle | 2019-01-01 |
| 10068325 | Method for three-dimensionally measuring a 3D aerial image of a lithography mask | Christoph Husemann, Johannes Ruoff, Sascha Perlitz, Hans-Jurgen Mann | 2018-09-04 |
| 9904060 | Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit | Thomas Frank, Dirk Doering, Holger Seitz, Mario Laengle | 2018-02-27 |
| 9535244 | Emulation of reproduction of masks corrected by local density variations | Holger Seitz, Thomas Thaler, Thomas Rademacher | 2017-01-03 |
| 9207544 | Method for simulating an aerial image | — | 2015-12-08 |
| 8970951 | Mask inspection microscope with variable illumination setting | Holger Seitz, Norbert Rosenkranz, Mario Laengle | 2015-03-03 |
| 8730474 | Method and apparatus for measuring of masks for the photo-lithography | Thomas Scheruebl, Holger Seitz, Axel Zibold, Rigo Richter | 2014-05-20 |
| RE44216 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | Michael Totzeck, Heiko Feldmann, Toralf Gruner, Karl-Heinz Schuster, Joern Greif-Wuestenbecker +3 more | 2013-05-14 |