Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11899358 | Method for measuring photomasks | Dmitry Simakov, Thomas Thaler, Steffen Steinert, Dirk Beyer | 2024-02-13 |
| 10788748 | Method and appliance for predicting the imaging result obtained with a mask when a lithography process is carried out | Thomas Thaler, Holger Seitz, Thomas Trautzsch, Mame Kouna Top-Diallo, Christoph Husemann | 2020-09-29 |
| 10698318 | Method and device for characterizing a mask for microlithography | Holger Seitz, Thomas Thaler, Thomas Frank, Ulrich Matejka, Markus Deguenther +2 more | 2020-06-30 |
| 10578975 | Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography | Thomas Thaler, Joachim Welte, Kujan Gorhad, Vladimir Dmitriev, Thomas Scheruebl +1 more | 2020-03-03 |
| 10539865 | Method and device for determining an OPC model | Holger Seitz, Thomas Thaler, Thomas Trautzsch | 2020-01-21 |
| 9869640 | Method and device for examining a mask | Thomas Trautzsch, Thomas Thaler | 2018-01-16 |
| 7029803 | Attenuating phase shift mask blank and photomask | Hans Becker, Gunter Hess, Oliver Goetzberger, Frank Schmidt, Frank Sobel +2 more | 2006-04-18 |