Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11914289 | Method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic mask | Joachim Welte, Uri Stern, Vladimir Dmitriev | 2024-02-27 |
| 11366383 | Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask | Vladimir Dmitriev, Joachim Welte, Tanya Serzhanyuk | 2022-06-21 |
| 10578975 | Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography | Thomas Thaler, Joachim Welte, Vladimir Dmitriev, Ute Buttgereit, Thomas Scheruebl +1 more | 2020-03-03 |