Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12001145 | Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model | Alexander Freytag, Christoph Husemann, Dirk Seidel, Carsten Schmidt | 2024-06-04 |
| 11774870 | Method for removing a particle from a mask system | Sergey Oshemkov, Shao-Chi Wei, Joerg Frederik Blumrich, Martin Voelcker | 2023-10-03 |
| 11079338 | Method for detecting a structure of a lithography mask and device for carrying out the method | Ulrich Matejka, Markus Koch, Christoph Husemann, Lars Stoppe, Beat Marco Mout | 2021-08-03 |
| 10578975 | Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography | Thomas Thaler, Joachim Welte, Kujan Gorhad, Vladimir Dmitriev, Ute Buttgereit +1 more | 2020-03-03 |
| 10572990 | Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system | Shusuke Yoshitake, Manabu Isobe, Dirk Beyer, Sven Heisig | 2020-02-25 |
| 9261775 | Method for analyzing a photomask | Anthony Garetto, Gilles Tabbone, Vahagn Sargsyan, Doug Uzzel, Jon Morgan | 2016-02-16 |
| 8731273 | Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section | Michael Arnz, Dirk Beyer, Wolfgang Harnisch | 2014-05-20 |
| 8730474 | Method and apparatus for measuring of masks for the photo-lithography | Holger Seitz, Ulrich Matejka, Axel Zibold, Rigo Richter | 2014-05-20 |
| 8718354 | Method for analyzing masks for photolithography | Ulrich Stroessner | 2014-05-06 |
| RE44216 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | Michael Totzeck, Heiko Feldmann, Toralf Gruner, Karl-Heinz Schuster, Joern Greif-Wuestenbecker +3 more | 2013-05-14 |
| 8264535 | Method and apparatus for analyzing a group of photolithographic masks | Oliver Kienzle, Rigo Richter, Norbert Rosenkranz, Yuji Kobiyama | 2012-09-11 |
| 7525115 | Arrangement for inspecting objects, especially masks in microlithography | Hans-Juergen Dobschal, Wolfgang Harnisch, Nobert Rosenkranz, Ralph Semmler | 2009-04-28 |
| 7286284 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | Michael Totzeck, Heiko Feldmann, Toralf Gruner, Karl-Heinz Schuster, Joern Greif-Wuestenbecker +3 more | 2007-10-23 |
| 6894837 | Imaging system for an extreme ultraviolet (EUV) beam-based microscope | Hans-Juergen Dobschal, Robert Brunner, Norbert Rosenkranz, Joern Greif-Wuestenbecker | 2005-05-17 |
| 6825454 | Automatic focusing device for an optical appliance | Norbert Czarnetzki, Stefan Mack, Toshiro Kurosawa, Eckard Hagemann | 2004-11-30 |
| 6674572 | Confocal microscopic device | Norbert Czarnetzki | 2004-01-06 |
| 6307690 | Microscope with light source | Norbert Czarnetzki, Manfred Matthae | 2001-10-23 |