Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11867642 | Inspection device for masks for semiconductor lithography and method | Thomas A. Zeuner, Heiko Feldmann | 2024-01-09 |
| 11619882 | Method and apparatus for characterizing a microlithographic mask | Ulrich Matejka, Thomas Frank, Asad Rasool | 2023-04-04 |
| 10928332 | Inspection device for masks for semiconductor lithography and method | Thomas A. Zeuner, Heiko Feldmann | 2021-02-23 |
| 10788748 | Method and appliance for predicting the imaging result obtained with a mask when a lithography process is carried out | Thomas Thaler, Ute Buttgereit, Thomas Trautzsch, Mame Kouna Top-Diallo, Christoph Husemann | 2020-09-29 |
| 10698318 | Method and device for characterizing a mask for microlithography | Ute Buttgereit, Thomas Thaler, Thomas Frank, Ulrich Matejka, Markus Deguenther +2 more | 2020-06-30 |
| 10578881 | Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit | Thomas Frank, Dirk Doering, Mario Laengle, Ulrich Matejka | 2020-03-03 |
| 10539865 | Method and device for determining an OPC model | Thomas Thaler, Ute Buttgereit, Thomas Trautzsch | 2020-01-21 |
| 10168539 | Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit | Thomas Frank, Dirk Doering, Mario Laengle, Ulrich Matejka | 2019-01-01 |
| 9904060 | Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit | Thomas Frank, Dirk Doering, Mario Laengle, Ulrich Matejka | 2018-02-27 |
| 9535244 | Emulation of reproduction of masks corrected by local density variations | Thomas Thaler, Ulrich Matejka, Thomas Rademacher | 2017-01-03 |
| 9268124 | Microscope and method for characterizing structures on an object | Thomas Frank, Thomas Trautzsch, Norbert Kerwien | 2016-02-23 |
| 9222897 | Method for characterizing a feature on a mask and device for carrying out the method | — | 2015-12-29 |
| 8970951 | Mask inspection microscope with variable illumination setting | Ulrich Matejka, Norbert Rosenkranz, Mario Laengle | 2015-03-03 |
| 8730474 | Method and apparatus for measuring of masks for the photo-lithography | Thomas Scheruebl, Ulrich Matejka, Axel Zibold, Rigo Richter | 2014-05-20 |