SW

Shao-Chi Wei

TSMC: 10 patents #2,782 of 12,232Top 25%
CG Carl Zeiss Smt Gmbh: 2 patents #466 of 1,189Top 40%
CS Carl Zeiss Sms: 1 patents #53 of 118Top 45%
Overall (All Time): #396,288 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12282260 Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask Yu-Hsin Hsu, Hao-Ming Chang, Sheng-Chang Hsu, Cheng-Ming Lin 2025-04-22
11914303 Apparatus and method for characterizing a microlithographic mask Johannes Ruoff, Heiko Feldmann, Ulrich Matejka, Thomas Thaler, Sascha Perlitz +2 more 2024-02-27
11774870 Method for removing a particle from a mask system Sergey Oshemkov, Joerg Frederik Blumrich, Martin Voelcker, Thomas Scheruebl 2023-10-03
11600484 Cleaning method, semiconductor manufacturing method and a system thereof Hao-Ming Chang 2023-03-07
11307492 Method for forming photomask and photolithography method Shih-Ming Chang, Minfeng Chen, Min-An Yang 2022-04-19
11209736 Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask Yu-Hsin Hsu, Hao-Ming Chang, Sheng-Chang Hsu, Cheng-Ming Lin 2021-12-28
10845699 Method for forming photomask and photolithography method Shih-Ming Chang, Minfeng Chen, Min-An Yang 2020-11-24
10816891 Photomask and fabrication method therefor Hao-Ming Chang, Chien-Hung Lai, Cheng-Ming Lin, Hsuan-Wen Wang, Min-An Yang +2 more 2020-10-27
10508953 Method and system for processing substrate by chemical solution in semiconductor manufacturing fabrication Min-An Yang, Hao-Ming Chang, Kuo-Chin Lin, Sheng-Chang Hsu, Li-Chih Lu +1 more 2019-12-17
10459332 Mask blank and fabrication method thereof, and method of fabricating photomask Hao-Ming Chang, Chih-Ming Chen, Cheng-Ming Lin, Sheng-Chang Hsu, Hsao Shih +1 more 2019-10-29
10101651 Photo mask assembly and optical apparatus including the same Cheng-Ming Lin, Sheng-Chang Hsu, Yu-Hsin Hsu, Hao-Ming Chang 2018-10-16
7223503 Method for repairing opaque defects on semiconductor mask reticles Wei-Lian Lin, Chian-Hun Lai, Chi-Kang Chang, Chia-Hsien Chen, Shan-Chan Suc +1 more 2007-05-29