Issued Patents All Time
Showing 1–25 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12319000 | 3D printing apparatus and 3D printing method for manufacturing a workpiece | Guillaume Gomard, Bernd Borrmann, Matthias Hillenbrand, Roman Zvahelskyi, Marc Frederik Mayer +1 more | 2025-06-03 |
| 11975481 | Adaptive closed-loop control of additive manufacturing for producing a workpiece | Marcin B. Bauza, Diana SPENGLER, Christoph Graf Vom Hagen, Claus Hermannstaedter, Robert Zarnetta +1 more | 2024-05-07 |
| 11633918 | Method and device for additive manufacturing utilizing simulation test results of a workpiece | Danny Krautz, Diana SPENGLER, Uwe Wolf, Christoph-Hilmar Graf Vom HAGEN, Christian Holzner +1 more | 2023-04-25 |
| 11506485 | Material testing by angle-variable illumination | Lars Stoppe, Thomas MILDE | 2022-11-22 |
| 11499814 | Inspection of bonding quality of transparent materials using optical coherence tomography | Marcin B. Bauza, Jochen Straub, Muzammil Arain, Matthew J. Everett | 2022-11-15 |
| 11400668 | 3D printing process for producing a spectacle lens | Bernhard von Blanckenhagen, Thomas Glöge | 2022-08-02 |
| 11279104 | Refractive optical component and spectacle lens produced therefrom, method for producing a refractive optical component, computer program product, construction data of a spectacle lens stored on a data medium, device for additive | Markus Haidl | 2022-03-22 |
| 10719915 | Method and apparatus for determining a defocusing valve and for image-based determination of a dimensional size | Philipp Jester, Oliver Schwarz, Matthias Barnert, Dirk Doering, Rainer Schmidt | 2020-07-21 |
| 10670884 | Spectacle lens and method for producing same | Thomas Glöge, Jeremias Gromotka, Bernhard von Blanckenhagen, Ralf Meschenmoser, Markus Haidl | 2020-06-02 |
| 10241423 | Method of operating a projection exposure tool for microlithography | Olaf Conradi, Ulrich Loering, Dirk Juergens, Ralf Mueller, Christian Wald | 2019-03-26 |
| 9778576 | Microlithography illumination system and microlithography illumination optical unit | Damian Fiolka, Hartmut Enkisch, Stephan Muellender | 2017-10-03 |
| 9442381 | Method of operating a projection exposure tool for microlithography | Olaf Conradi, Ulrich Loering, Dirk Juergens, Ralf Mueller, Christian Wald | 2016-09-13 |
| 9411145 | Test sample device and test method for an optical microscope with subwavelength resolution | Thomas Kalkbrenner | 2016-08-09 |
| 9304405 | Microlithography illumination system and microlithography illumination optical unit | Damian Fiolka, Hartmut Enkisch, Stephan Muellender | 2016-04-05 |
| 9134626 | Microscope and microscopy method for space-resolved measurement of a predetermined structure, in particular a structure of a lithographic mask | Hans-Juergen Mann, Norbert Kerwien | 2015-09-15 |
| 9063439 | Projection objective for microlithography with stray light compensation and related methods | Aksel Goehnermeier, Daniel Kraehmer, Vladimir Kamenov | 2015-06-23 |
| 8982325 | Microlithographic projection exposure apparatus | Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann +1 more | 2015-03-17 |
| 8854606 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Hans-Jurgen Mann, Wolfgang Singer, Toralf Gruner, Olaf Dittmann | 2014-10-07 |
| 8767181 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Daniel Kraehmer, Johannes Wangler, Markus Brotsack, Nils Dieckmann +4 more | 2014-07-01 |
| 8736849 | Method and apparatus for measuring structures on photolithography masks | Ulrich Stroessner, Gerd Klose | 2014-05-27 |
| 8605257 | Projection system with compensation of intensity variations and compensation element therefor | Patrick Scheible, Alexandra Pazidis, Reiner Garreis, Heiko Feldmann, Paul Graeupner +2 more | 2013-12-10 |
| 8593618 | Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method | — | 2013-11-26 |
| 8570488 | Transmitting optical element and objective for a microlithographic projection exposure apparatus | Wilfried Clauss, Werner Mueller-Rissmann | 2013-10-29 |
| RE44216 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | Heiko Feldmann, Toralf Gruner, Karl-Heinz Schuster, Joern Greif-Wuestenbecker, Thomas Scheruebl +3 more | 2013-05-14 |
| 8436982 | Projection objective for microlithography | Helmut Beierl, Heiko Feldmann, Jochen Hetzler | 2013-05-07 |