ND

Nils Dieckmann

CG Carl Zeiss Smt Gmbh: 13 patents #111 of 1,189Top 10%
CS Carl Zeiss Stiftung: 2 patents #166 of 654Top 30%
📍 Wertingen, DE: #2 of 46 inventorsTop 5%
Overall (All Time): #298,075 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
9274435 Illumination system or projection objective of a microlithographic projection exposure apparatus Damian Fiolka 2016-03-01
9116441 Illumination system of a microlithographic projection exposure apparatus Manfred Maul, Christian Hettich, Oliver Natt 2015-08-25
8767181 Microlithographic exposure method as well as a projection exposure system for carrying out the method Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack +4 more 2014-07-01
8488104 Projection objective with diaphragms Alexander Wolf, Christian Holland, Ulrich Loering, Franz Sorg 2013-07-16
8169594 Illumination system of a microlithographic projection exposure apparatus Manfred Maul, Christian Hettich, Oliver Natt 2012-05-01
8081293 Illumination system of a microlithographic projection exposure apparatus Damian Fiolka 2011-12-20
7847921 Microlithographic exposure method as well as a projection exposure system for carrying out the method Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack +4 more 2010-12-07
7808615 Projection exposure apparatus and method for operating the same Toralf Gruner, Olaf Conradi, Markus Schwab, Olaf Dittmann, Michael Totzeck +2 more 2010-10-05
7593095 System for reducing the coherence of laser radiation Damian Fiolka, Manfred Maul 2009-09-22
7408616 Microlithographic exposure method as well as a projection exposure system for carrying out the method Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack +4 more 2008-08-05
7329886 EUV illumination system having a plurality of light sources for illuminating an optical element Wolfgang Singer, Martin Antoni, Dirk Rothweiler, Jorg Schultz 2008-02-12
6985218 Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus 2006-01-10
6936825 Process for the decontamination of microlithographic projection exposure devices Michael Gerhard, Christine Sieler, Marcus Zehetbauer, Martin Schriever, Gerd Reisinger 2005-08-30
6707537 Projection exposure system Jess Köhler, Johannes Wangler 2004-03-16
6636367 Projection exposure device Ulrich Drodofsky, Martin Antoni, Hans-Joachim Miesner 2003-10-21
6512780 System for compensating directional and positional fluctuations in light produced by a laser 2003-01-28