Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7583433 | Multi mirror system for an illumination system | Martin Antoni, Isabel Escudero-Sanz, Wolfgang Singer, Johannes Wangler | 2009-09-01 |
| 7443948 | Illumination system particularly for microlithography | Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni +2 more | 2008-10-28 |
| 7372634 | Reticle-masking objective with aspherical lenses | Johannes Wangler, Karl-Heinz Schuster, Alexander Sohmer, Alexander Epple, Jurgen Grunwald | 2008-05-13 |
| 7329886 | EUV illumination system having a plurality of light sources for illuminating an optical element | Wolfgang Singer, Martin Antoni, Nils Dieckmann, Dirk Rothweiler | 2008-02-12 |
| 7148495 | Illumination system, particularly for EUV lithography | Johannes Wangler | 2006-12-12 |
| 7130129 | Reticle-masking objective with aspherical lenses | Jurgen Grunwald, Johannes Wangler, Karl-Heinz Schuster, Alexander Sohmer, Alexander Epple | 2006-10-31 |
| 7126137 | Illumination system with field mirrors for producing uniform scanning energy | Wolfgang Singer, Joachim Hainz, Hans-Joachim Frasch, Johannes Wangler, Joachim Wietzorrek | 2006-10-24 |
| 7071476 | Illumination system with a plurality of light sources | Dirk Rothweiler | 2006-07-04 |
| 7006595 | Illumination system particularly for microlithography | Wolfgang Singer, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni +2 more | 2006-02-28 |
| 6859515 | Illumination system, particularly for EUV lithography | Johannes Wangler | 2005-02-22 |
| 6859328 | Illumination system particularly for microlithography | Johannes Wangler, Karl-Hein Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni +2 more | 2005-02-22 |
| 6840640 | Multi mirror system for an illumination system | Martin Antoni, Isabel Escudero-Sanz, Wolfgang Singer, Johannes Wangler | 2005-01-11 |
| 6770894 | Illumination system with field mirrors for producing uniform scanning energy | — | 2004-08-03 |
| 6704095 | Control of a distribution of illumination in an exit pupil of an EUV illumination system | — | 2004-03-09 |
| 6680803 | Partial objective in an illuminating systems | Alexander Sohmer, Alexander Epple, Johannes Wangler, Christa Muller | 2004-01-20 |
| 6570168 | Illumination system with a plurality of light sources | Dirk Rothweiler | 2003-05-27 |
| 6507440 | Components with an anamorphotic effect for reducing an aspect ratio of a raster element in an illumination system | — | 2003-01-14 |
| 6445442 | Projection-microlithographic device | Rudolf Von Bünau, Johannes Wangler | 2002-09-03 |
| 6438199 | Illumination system particularly for microlithography | Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni | 2002-08-20 |
| 6400794 | Illumination system, particularly for EUV lithography | Johannes Wangler | 2002-06-04 |
| 6366410 | Reticular objective for microlithography-projection exposure installations | Johannes Wangler, Karl-Heinz Schuster | 2002-04-02 |
| 6295122 | Illumination system and REMA objective with lens displacement and operating process therefor | Johannes Wangler | 2001-09-25 |
| 6198793 | Illumination system particularly for EUV lithography | Johannes Wangler, Karl-Heinz Schuster, Udo Dinger | 2001-03-06 |