Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12295661 | Combination device for tonometrical measuring and drug application on an eye | Johannes Kindt, Martin Hacker, Tobias Bühren, Thomas K. Fitzmorris, Daniel Bublitz +2 more | 2025-05-13 |
| 10194797 | Method for selecting an intraocular lens to be implanted into an eye | Tobias Bühren | 2019-02-05 |
| 9814382 | Method for determining the power of an intraocular lens | Burkhard E. Wagner, Scott A. Meyer, Xunchang Chen | 2017-11-14 |
| 9462938 | Method for determining the power of an intraocular lens | Burkhard E. Wagner, Scott A. Meyer, Xunchang Chen | 2016-10-11 |
| 9144375 | Method for determining the power of an intraocular lens | Burkhart Wagner, Scott A. Meyer, Xunchang Chen | 2015-09-29 |
| 8801184 | System for the improved imaging of eye structures | Martin Hacker, Burkhard E. Wagner | 2014-08-12 |
| 6784977 | Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography | Christian Hembd-Söllner, Hubert Holderer | 2004-08-31 |
| 6781668 | Optical arrangement | Karl-Heinz Schuster, Hubert Holderer, Christian Wagner, Jochen Becker, Stefan Xalter +1 more | 2004-08-24 |
| 6600608 | Catadioptric objective comprising two intermediate images | David Shafer, Alois Herkommer, Karl-Heinz Schuster, Gerd Furter, Wilhelm Ulrich | 2003-07-29 |
| 6593998 | Projection exposure system | Toralf Gruner, Erwin Gaber | 2003-07-15 |
| 6583850 | Optical system | Wolfgang Hummel, Hubert Holderer, Christian Wagner, Jochen Becker, Stefan Xalter | 2003-06-24 |
| 6521877 | Optical arrangement having improved temperature distribution within an optical element | Werner Müller-Rissmann, Hubert Holderer, Christian Wagner, Jochen Becker, Stefan Xalter +1 more | 2003-02-18 |
| 6522392 | Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system | Werner Müller-Rissmann, Hubert Holderer, Christian Wagner, Jochen Becker, Stefan Xalter +1 more | 2003-02-18 |
| 6504597 | Optical arrangement | Karl-Heinz Schuster, Hubert Holderer, Christian Wagner, Jochen Becker, Stefan Xalter +1 more | 2003-01-07 |
| 6466382 | Optical arrangement | Werner Müller-Rissmann, Hubert Holderer, Christian Wagner, Jochen Becker, Stefan Xalter +1 more | 2002-10-15 |
| 6445442 | Projection-microlithographic device | Jorg Schultz, Johannes Wangler | 2002-09-03 |
| 5863712 | Pattern forming method, projection exposure system, and semiconductor device fabrication method | Hiroshi Fukuda | 1999-01-26 |
| 5715039 | Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns | Hiroshi Fukuda | 1998-02-03 |
| 5438204 | Twin-mask, and method and system for using same to pattern microelectronic substrates | Roger F. W. Pease | 1995-08-01 |