Issued Patents All Time
Showing 1–25 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10599041 | Facet mirror | Stig Bieling, Markus Deguenther | 2020-03-24 |
| 10146135 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Markus Deguenther, Michael Patra, Manfred Maul, Damian Fiolka +1 more | 2018-12-04 |
| 10018917 | Illumination optical unit for EUV projection lithography | Stig Bieling, Martin Endres, Markus Deguenther, Michael Patra | 2018-07-10 |
| 9946161 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Ingo Saenger, Ralf Scharnweber, Olaf Dittmann, Toralf Gruner, Gundula Weiss +5 more | 2018-04-17 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2018-02-20 |
| 9791784 | Assembly for a projection exposure apparatus for EUV projection lithography | Michael Patra, Stig Bieling, Markus Deguenther | 2017-10-17 |
| 9575414 | Illumination system for a microlithographic projection exposure apparatus | Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther +4 more | 2017-02-21 |
| 9563129 | Monitor system for determining orientations of mirror elements and EUV lithography system | Johannes Eisenmenger, Markus Deguenther, Michael Patra | 2017-02-07 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2016-01-19 |
| 9217930 | Illumination system for a microlithographic projection exposure apparatus | Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther +4 more | 2015-12-22 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-28 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-21 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-07 |
| 8891057 | Microlithographic projection exposure apparatus | Michael Layh, Markus Deguenther, Michael Patra, Manfred Maul, Damian Fiolka +1 more | 2014-11-18 |
| 8767181 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Markus Brotsack, Nils Dieckmann +4 more | 2014-07-01 |
| 8730455 | Illumination system for a microlithographic projection exposure apparatus | Damian Fiolka, Manfred Maul, Axel Scholz, Markus Deguenther, Vladimir Davydenko | 2014-05-20 |
| 8724086 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Markus Deguenther, Michael Patra, Manfred Maul, Damian Fiolka +1 more | 2014-05-13 |
| 8520307 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Andre Bresan +6 more | 2013-08-27 |
| 8395756 | Illumination system for a microlithographic projection exposure apparatus | Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther +4 more | 2013-03-12 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2012-12-25 |
| 8294877 | Illumination optical unit for projection lithography | Markus Deguenther, Stig Bieling | 2012-10-23 |
| 8134687 | Illumination system of a microlithographic exposure apparatus | Wolfgang Singer, Rafael Egger, Wilhelm Ulrich | 2012-03-13 |
| 8004656 | Illumination system for a microlithographic projection exposure apparatus | Damian Fiolka, Manfred Maul, Vladimir Davydenko, Axel Scholz, Markus Deguenther | 2011-08-23 |
| 7977651 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Karl-Heinz Schuster, Udo Dinger +2 more | 2011-07-12 |
| 7880969 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Andre Bresan +6 more | 2011-02-01 |