Issued Patents All Time
Showing 51–75 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7091505 | Collector with fastening devices for fastening mirror shells | Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek +5 more | 2006-08-15 |
| 7015489 | Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm | Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek +1 more | 2006-03-21 |
| 7006595 | Illumination system particularly for microlithography | Wolfgang Singer, Jorg Schultz, Karl-Heinz Schuster, Udo Dinger, Martin Antoni +2 more | 2006-02-28 |
| 6964485 | Collector for an illumination system with a wavelength of less than or equal to 193 nm | Wolfgang Singer | 2005-11-15 |
| 6947120 | Illumination system particularly for microlithography | Martin Antoni, Wolfgang Singer | 2005-09-20 |
| 6947124 | Illumination system particularly for microlithography | Martin Antoni, Wolfgang Singer | 2005-09-20 |
| 6927403 | Illumination system that suppresses debris from a light source | Wolfgang Singer, Martin Antoni, Wilhelm Egle, Vadim Yevgenyevich Banine, Erik Roelof Loopstra | 2005-08-09 |
| 6885434 | Diaphragm for an integrator unit | Markus Degünther | 2005-04-26 |
| 6864960 | Zoom system for an illumination device | Jess Koehler | 2005-03-08 |
| 6858853 | Illumination system particularly for microlithography | Martin Antoni, Wolfgang Singer | 2005-02-22 |
| 6859328 | Illumination system particularly for microlithography | Jorg Schultz, Karl-Hein Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni +2 more | 2005-02-22 |
| 6859515 | Illumination system, particularly for EUV lithography | Jorg Schultz | 2005-02-22 |
| 6840640 | Multi mirror system for an illumination system | Martin Antoni, Isabel Escudero-Sanz, Wolfgang Singer, Jorg Schultz | 2005-01-11 |
| 6836530 | Illumination system with a plurality of individual gratings | Wolfgang Singer, Markus Weiss, Bernd Kleemann, Karlfried Osterried, Frank Melzer +2 more | 2004-12-28 |
| 6733165 | Optical integrator for an illumination device | Sijbe Abraham Van Der Lei, Marnix Aldert Tas, Jan Hoegee, Paul Van Der Veen, Jess Koehler | 2004-05-11 |
| 6707537 | Projection exposure system | Nils Dieckmann, Jess Köhler | 2004-03-16 |
| 6680803 | Partial objective in an illuminating systems | Jorg Schultz, Alexander Sohmer, Alexander Epple, Christa Muller | 2004-01-20 |
| 6597511 | Microlithographic illuminating system and microlithographic projection exposure arrangement incorporating said system | Jess Köhler | 2003-07-22 |
| 6583937 | Illuminating system of a microlithographic projection exposure arrangement | Jess Köhler | 2003-06-24 |
| 6445442 | Projection-microlithographic device | Rudolf Von Bünau, Jorg Schultz | 2002-09-03 |
| 6438199 | Illumination system particularly for microlithography | Jorg Schultz, Karl-Heinz Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni | 2002-08-20 |
| 6400794 | Illumination system, particularly for EUV lithography | Jorg Schultz | 2002-06-04 |
| 6366410 | Reticular objective for microlithography-projection exposure installations | Jorg Schultz, Karl-Heinz Schuster | 2002-04-02 |
| 6295122 | Illumination system and REMA objective with lens displacement and operating process therefor | Jorg Schultz | 2001-09-25 |
| 6285443 | Illuminating arrangement for a projection microlithographic apparatus | Gerhard Ittner | 2001-09-04 |