Issued Patents All Time
Showing 26–50 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE42065 | Illumination system particularly for microlithography | Martin Antoni, Wolfgang Singer | 2011-01-25 |
| 7847921 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Markus Brotsack, Nils Dieckmann +4 more | 2010-12-07 |
| RE41667 | Illumination system particularly for microlithography | Martin Antoni, Wolfgang Singer | 2010-09-14 |
| 7714983 | Illumination system for a microlithography projection exposure installation | Jess Koehler, Markus Brotsack, Wolfgang Singer, Damian Fiolka, Manfred Maul | 2010-05-11 |
| 7605386 | Optical device with raster elements, and illumination system with the optical device | Wolfgang Singer, Markus Deguenther, Birgit Kuerz, Christoph Menke | 2009-10-20 |
| 7592598 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Karl-Heinz Schuster, Udo Dinger +2 more | 2009-09-22 |
| 7583433 | Multi mirror system for an illumination system | Martin Antoni, Isabel Escudero-Sanz, Wolfgang Singer, Jorg Schultz | 2009-09-01 |
| 7551361 | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type | Hans-Juergen Rostalski, Alexander Epple, Aurelian Dodoc, Karl-Heinz Schuster, Joerg Schultz +3 more | 2009-06-23 |
| 7542217 | Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus | Wolfgang Singer, Markus Deguenther, Birgit Kuerz, Rafael Egger, Manfred Maul | 2009-06-02 |
| 7473907 | Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination | Wolfgang Singer, Martin Antoni, Markus Weiss, Vadim Yevgenyevich Banine, Marcel Mathijs Theodore Marie Dierichs +5 more | 2009-01-06 |
| 7460212 | Collector configured of mirror shells | Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek +1 more | 2008-12-02 |
| 7456408 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Karl-Heinz Schuster, Udo Dinger +2 more | 2008-11-25 |
| 7443948 | Illumination system particularly for microlithography | Jorg Schultz, Karl-Heinz Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni +2 more | 2008-10-28 |
| 7408616 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Markus Brotsack, Nils Dieckmann +4 more | 2008-08-05 |
| 7372634 | Reticle-masking objective with aspherical lenses | Karl-Heinz Schuster, Alexander Sohmer, Alexander Epple, Jorg Schultz, Jurgen Grunwald | 2008-05-13 |
| 7348565 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Karl-Heinz Schuster, Udo Dinger +2 more | 2008-03-25 |
| 7321126 | Collector with fastening devices for fastening mirror shells | Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek +5 more | 2008-01-22 |
| 7312462 | Illumination system having a nested collector for annular illumination of an exit pupil | Wolfgang Singer, Eric Sohmen | 2007-12-25 |
| 7244954 | Collector having unused region for illumination systems using a wavelength ≦193 nm | Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek +1 more | 2007-07-17 |
| 7186983 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Karl-Heinz Schuster, Udo Dinger +2 more | 2007-03-06 |
| 7148495 | Illumination system, particularly for EUV lithography | Jorg Schultz | 2006-12-12 |
| 7142285 | Illumination system particularly for microlithography | Martin Antoni, Wolfgang Singer | 2006-11-28 |
| 7130129 | Reticle-masking objective with aspherical lenses | Jurgen Grunwald, Karl-Heinz Schuster, Alexander Sohmer, Alexander Epple, Jorg Schultz | 2006-10-31 |
| 7126137 | Illumination system with field mirrors for producing uniform scanning energy | Wolfgang Singer, Joachim Hainz, Hans-Joachim Frasch, Joachim Wietzorrek, Jorg Schultz | 2006-10-24 |
| 7109497 | Illumination system particularly for microlithography | Martin Antoni, Wolfgang Singer | 2006-09-19 |