Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10151982 | Illumination system of a microlithographic projection exposure apparatus with a birefringent element | Damian Fiolka, Daniel Walldorf | 2018-12-11 |
| 10041836 | Polarization measuring device, lithography apparatus, measuring arrangement, and method for polarization measurement | — | 2018-08-07 |
| 9955563 | EUV light source for generating a usable output beam for a projection exposure apparatus | Manfred Maul, Christoph Hennerkes, Johannes Ruoff, Daniel Kraehmer | 2018-04-24 |
| 9946161 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Ralf Scharnweber, Olaf Dittmann, Toralf Gruner, Gundula Weiss, Andras G. Major +5 more | 2018-04-17 |
| 9817317 | Optical system of a microlithographic projection exposure apparatus | Frank Schlesener | 2017-11-14 |
| 9798249 | Method and apparatus for compensating at least one defect of an optical system | Vladimir Dmitriev, Frank Schlesener, Markus Mengel, Johannes Ruoff | 2017-10-24 |
| 9678432 | Optical assembly for increasing the etendue | Christoph Hennerkes | 2017-06-13 |
| 9678439 | Mirror | Johannes Ruoff, Martin Endres, Thomas Eisenmann | 2017-06-13 |
| 9665008 | Mirror system comprising at least one mirror for use for guiding illumination and imaging light in EUV projection lithography | Frank Schlesener | 2017-05-30 |
| 9645503 | Collector | Joerg Zimmermann, Daniel Kraehmer, Johannes Ruoff, Martin Meier, Frank Schlesener +2 more | 2017-05-09 |
| 9632413 | Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system | Frank Schlesener | 2017-04-25 |
| 9588433 | Optical system, in particular of a microlithographic projection exposure apparatus | — | 2017-03-07 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Frank Schlesener, Olaf Dittmann, Aksel Goehnermeier, Alexandra Pazidis, Thomas Schicketanz +2 more | 2017-02-28 |
| 9551941 | Illumination system for an EUV lithography device and facet mirror therefor | Johannes Ruoff, Joerg Zimmermann, Daniel Kraehmer, Christoph Hennerkes, Frank Schlesener | 2017-01-24 |
| 9507269 | Illumination optical unit for projection lithography | Christoph Hennerkes, Joerg Zimmermann, Johannes Ruoff, Martin Meier, Frank Schlesener | 2016-11-29 |
| 9500956 | Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure | Joerg Zimmermann, Johannes Ruoff, Martin Meier, Frank Schlesener, Christoph Hennerkes | 2016-11-22 |
| 9488918 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Frank Schlesener | 2016-11-08 |
| 9477025 | EUV light source for generating a used output beam for a projection exposure apparatus | — | 2016-10-25 |
| 9442385 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Frank Schlesener | 2016-09-13 |
| 9411245 | Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus | Frank Schlesener | 2016-08-09 |
| 9405202 | Optical system of a microlithographic projection exposure apparatus | Christoph Hennerkes | 2016-08-02 |
| 9323156 | Optical system of a microlithographic projection exposure apparatus | Olaf Dittmann, Joerg Zimmermann | 2016-04-26 |
| 9316920 | Illumination system of a microlithographic projection exposure apparatus with a birefringent element | Damian Fiolka, Daniel Walldorf | 2016-04-19 |
| 9195057 | Illumination optical unit for a projection exposure apparatus | — | 2015-11-24 |
| 9182677 | Optical system of a microlithographic projection exposure apparatus | Frank Schlesener | 2015-11-10 |