Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11609506 | System and method for lateral shearing interferometry in an inspection tool | — | 2023-03-21 |
| 9798249 | Method and apparatus for compensating at least one defect of an optical system | Vladimir Dmitriev, Ingo Saenger, Frank Schlesener, Johannes Ruoff | 2017-10-24 |
| 9429495 | System for measuring the image quality of an optical imaging system | Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen | 2016-08-30 |
| 9274440 | Arrangement for and method of characterising the polarization properties of an optical system | Uwe Hempelmann, Peter Huber | 2016-03-01 |
| 9034539 | Controllable transmission and phase compensation of transparent material | Sergey Oshemkov, Ralph Klaesges, Vladimir Kruglyakov, Eitan Zait, Vladimir Dmitriev +2 more | 2015-05-19 |
| 8823948 | System for measuring the image quality of an optical imaging system | Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen | 2014-09-02 |
| 8735030 | Method and apparatus for modifying a substrate surface of a photolithographic mask | Sergey Oshemkov, Ralph Klaesges | 2014-05-27 |
| 8675178 | Microlithographic projection exposure apparatus | — | 2014-03-18 |
| 8488127 | System for measuring the image quality of an optical imaging system | Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen | 2013-07-16 |
| 7924436 | Method for approximating an influence of an optical system on the state of polarization of optical radiation | Michael Totzeck | 2011-04-12 |
| 7796274 | System for measuring the image quality of an optical imaging system | Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathussen | 2010-09-14 |
| 7760366 | System for measuring the image quality of an optical imaging system | Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen | 2010-07-20 |
| 7456933 | Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus | Ulrich Wegmann, Vladimir Kamenov, Thomas Muelders, Toralf Gruner | 2008-11-25 |
| 7289223 | Method and apparatus for spatially resolved polarimetry | — | 2007-10-30 |
| 7286245 | Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser | Ulrich Wegmann, Michael Hartl, Manfred Dahl, Helmut Haidner, Martin Schriever +1 more | 2007-10-23 |
| 7277182 | Apparatus for polarization-specific examination, optical imaging system, and calibration method | Ulrich Wegmann | 2007-10-02 |