HH

Helmut Haidner

CG Carl Zeiss Smt Gmbh: 17 patents #80 of 1,189Top 7%
CS Carl Zeiss Sms: 1 patents #53 of 118Top 45%
Overall (All Time): #253,014 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
11441970 Measurement apparatus for measuring a wavefront aberration of an imaging optical system Albrecht Ehrmann, Michael Samaniego 2022-09-13
10324380 Projection exposure apparatus and method for measuring an imaging aberration Stig Bieling 2019-06-18
10006807 Apparatus for determining an optical property of an optical imaging system Albrecht Ehrmann, Markus Goeppert 2018-06-26
9494483 Measuring system for measuring an imaging quality of an EUV lens Ralf Frese, Michael Samaniego, Markus Deguenther, Rainer Hoch, Martin Schriever 2016-11-15
9482968 Measuring system Markus Goeppert, Rolf Freimann, Christoph Striebel 2016-11-01
8836929 Device and method for the optical measurement of an optical system by using an immersion fluid Ulrich Wegmann, Uwe Shellhorn, Joachim Stuehler, Albrecht Ehrmann, Martin Schriever +1 more 2014-09-16
8134716 Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methods Wolfgang Emer, Ulrich Wegmann 2012-03-13
8120763 Device and method for the optical measurement of an optical system by using an immersion fluid Ulrich Wegmann, Uwe Schellhorn, Joachim Stuehler, Albrecht Ehrmann, Martin Schriever +1 more 2012-02-21
7911624 Device and method for the interferometric measurement of phase masks Ulrich Wegmann 2011-03-22
7623218 Method of manufacturing a miniaturized device Ulrich Wegmann 2009-11-24
7417745 Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry Wolfgang Emer, Rainer Hoch, Ulrich Wegmann, Martin Schriever, Markus Goeppert 2008-08-26
7408652 Device and method for the optical measurement of an optical system by using an immersion fluid Ulrich Wegmann, Uwe Schellhorn, Joachim Stuehler, Albrecht Ehrmann, Martin Schriever +1 more 2008-08-05
7388696 Diffuser, wavefront source, wavefront sensor and projection exposure apparatus Martin Schriever 2008-06-17
7336371 Apparatus and method for measuring the wavefront of an optical system Markus Goeppert, Martin Schriever, Ulrich Wegmann 2008-02-26
7333216 Apparatus for wavefront detection Ulrich Wegmann, Martin Schriever 2008-02-19
7301646 Device and method for the determination of imaging errors and microlithography projection exposure system Ulrich Wegmann, Gordon Doering 2007-11-27
7286245 Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser Ulrich Wegmann, Michael Hartl, Markus Mengel, Manfred Dahl, Martin Schriever +1 more 2007-10-23
7158237 Interferometric measuring device and projection exposure installation comprising such measuring device Martin Schriever, Ulrich Wegmann 2007-01-02