Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9494483 | Measuring system for measuring an imaging quality of an EUV lens | Ralf Frese, Michael Samaniego, Markus Deguenther, Helmut Haidner, Rainer Hoch | 2016-11-15 |
| 8836929 | Device and method for the optical measurement of an optical system by using an immersion fluid | Ulrich Wegmann, Uwe Shellhorn, Joachim Stuehler, Albrecht Ehrmann, Markus Goeppert +1 more | 2014-09-16 |
| 8169595 | Optical apparatus and method for modifying the imaging behavior of such apparatus | Ulrich Wegmann, Stefan Hembacher, Bernhard Geuppert, Juergen Huber, Norbert Kerwien +2 more | 2012-05-01 |
| 8120763 | Device and method for the optical measurement of an optical system by using an immersion fluid | Ulrich Wegmann, Uwe Schellhorn, Joachim Stuehler, Albrecht Ehrmann, Markus Goeppert +1 more | 2012-02-21 |
| 7570345 | Method of optimizing imaging performance | Gerd Reisinger, Manfred Maul, Paul Graeupner, Ulrich Wegmann | 2009-08-04 |
| 7436521 | Optical measuring apparatus and operating method for imaging error correction in an optical imaging system | Wolfgang Emer, Ulrich Wegmann, Rainer Hoch | 2008-10-14 |
| 7417745 | Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry | Helmut Haidner, Wolfgang Emer, Rainer Hoch, Ulrich Wegmann, Markus Goeppert | 2008-08-26 |
| 7408652 | Device and method for the optical measurement of an optical system by using an immersion fluid | Ulrich Wegmann, Uwe Schellhorn, Joachim Stuehler, Helmut Haidner, Albrecht Ehrmann +1 more | 2008-08-05 |
| 7388696 | Diffuser, wavefront source, wavefront sensor and projection exposure apparatus | Helmut Haidner | 2008-06-17 |
| 7336371 | Apparatus and method for measuring the wavefront of an optical system | Helmut Haidner, Markus Goeppert, Ulrich Wegmann | 2008-02-26 |
| 7333216 | Apparatus for wavefront detection | Ulrich Wegmann, Helmut Haidner | 2008-02-19 |
| 7286245 | Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser | Ulrich Wegmann, Michael Hartl, Markus Mengel, Manfred Dahl, Helmut Haidner +1 more | 2007-10-23 |
| 7233386 | Method of optimizing imaging performance | Gerd Reisinger, Manfred Maul, Paul Graeupner, Ulrich Wegmann | 2007-06-19 |
| 7230220 | Method of determining optical properties and projection exposure system comprising a wavefront detection system | Steffen Lauer, Ulrich Wegmann, Wolfgang Emer, Harald Sakowski | 2007-06-12 |
| 7158237 | Interferometric measuring device and projection exposure installation comprising such measuring device | Ulrich Wegmann, Helmut Haidner | 2007-01-02 |
| 7113260 | Projection exposure system for microlithography and method for generating microlithographic images | Karl-Heinz Schuster, Christian Wagner | 2006-09-26 |
| 6972831 | Projection exposure system for microlithography and method for generating microlithographic images | Karl-Heinz Schuster, Christian Wagner | 2005-12-06 |
| 6950174 | Projection exposure system for microlithography and method for generating microlithographic images | Karl-Heinz Schuster, Christian Wagner | 2005-09-27 |
| 6936825 | Process for the decontamination of microlithographic projection exposure devices | Michael Gerhard, Nils Dieckmann, Christine Sieler, Marcus Zehetbauer, Gerd Reisinger | 2005-08-30 |
| 6930758 | Projection exposure system for microlithography and method for generating microlithographic images | Karl-Heinz Schuster, Christian Wagner | 2005-08-16 |