Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11982788 | Method for forming nanostructures on a surface and optical element | Vitaliy Shklover | 2024-05-14 |
| 11520087 | Reflective optical element | Konstantin Forcht, Christoph Zaczek | 2022-12-06 |
| 9733395 | Microlithographic projection exposure apparatus | Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann +3 more | 2017-08-15 |
| 9684252 | Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element | Christoph Zaczek | 2017-06-20 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Frank Schlesener, Ingo Saenger, Olaf Dittmann, Aksel Goehnermeier, Thomas Schicketanz +2 more | 2017-02-28 |
| 9297936 | Mirror with dielectric coating | Jeffrey Erxmeyer, Horst Feldermann | 2016-03-29 |
| 8928980 | Micromirror arrangement having a coating and method for the production thereof | Karl-Stefan Weissenrieder, Roland Loercher | 2015-01-06 |
| 8605257 | Projection system with compensation of intensity variations and compensation element therefor | Patrick Scheible, Reiner Garreis, Michael Totzeck, Heiko Feldmann, Paul Graeupner +2 more | 2013-12-10 |
| 8488103 | Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same | Christoph Zaczek, Horst Feldermann, Peter Huber | 2013-07-16 |
| 8435726 | Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus | Christoph Zaczek, Alexander Hirnet, Herbert Fink, Dieter Schmerek | 2013-05-07 |
| 8395753 | Microlithographic projection exposure apparatus | Damian Fiolka, Michael Totzeck, Michael Ricker | 2013-03-12 |
| 8339575 | Off-axis objectives with rotatable optical element | Aksel Goehnermeier | 2012-12-25 |
| 8049964 | Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element | Christoph Zaczek | 2011-11-01 |
| 7817250 | Microlithographic projection exposure apparatus | Damian Fiolka, Michael Totzeck, Michael Ricker | 2010-10-19 |
| 7738187 | Optical element, projection lens and associated projection exposure apparatus | Stephan Six, Ruediger Duesing, Gennady Fedosenko | 2010-06-15 |
| 7518797 | Microlithographic exposure apparatus | Christoph Zaczek | 2009-04-14 |
| 7460206 | Projection objective for immersion lithography | Patrick Scheible, Alexander Hirnet, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill +5 more | 2008-12-02 |
| 7239447 | Objective with crystal lenses | Aksel Goehnermeier, Birgit Kuerz, Christoph Zaczek, Daniel Kraehmer | 2007-07-03 |
| 6796664 | Method and device for decontaminating optical surfaces | Jens Luedecke, Christoph Zazcek, Jens Ullmann, Annette Muehlpfordt, Michael Thier +1 more | 2004-09-28 |