Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12117731 | Method for producing a mirror of a microlithographic projection exposure apparatus | Erik Loopstra, Eric Eva, Drew Chieda, Matthew Lipson, Victor Antonio PEREZ-FALCON +1 more | 2024-10-15 |
| 11520087 | Reflective optical element | Konstantin Forcht, Alexandra Pazidis | 2022-12-06 |
| 11474281 | Optical element and method of making an optical element | Christian Beder, Erwin Gaber, Diana Tonova, Michael Sundermann | 2022-10-18 |
| 10698135 | Optical element and method of making an optical element | Christian Beder, Erwin Gaber, Diana Tonova, Michael Sundermann | 2020-06-30 |
| 10578976 | Catadioptric projection objective including a reflective optical component and a measuring device | Sascha Bleidistel, Toralf Gruner, Ralf Mueller | 2020-03-03 |
| 10146137 | Catadioptric projection objective including a reflective optical component and a measuring device | Sascha Bleidistel, Toralf Gruner, Ralf Mueller | 2018-12-04 |
| 9915876 | EUV mirror and optical system comprising EUV mirror | Thomas Schicketanz, Hans-Jochen Paul | 2018-03-13 |
| 9684252 | Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element | Alexandra Pazidis | 2017-06-20 |
| 9494718 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Stephan Muellender, Joern WEBER, Wilfried Clauss, Hans-Jochen Paul, Gerhard Braun +4 more | 2016-11-15 |
| 9188771 | Reflective optical imaging system | Aurelian Dodoc, Sascha Migura, Gerhard Braun, Hans-Juergen Mann, Hans-Jochen Paul | 2015-11-17 |
| 9146475 | Projection exposure system and projection exposure method | Paul Graupner, Olaf Conradi, Wilhelm Ulrich, Helmut Beierl, Toralf Gruner +1 more | 2015-09-29 |
| 8546776 | Optical system for EUV lithography with a charged-particle source | Dirk Heinrich Ehm, Markus Weiss, Tobias Hackl, Wolfgang Seitz | 2013-10-01 |
| 8488103 | Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same | Alexandra Pazidis, Horst Feldermann, Peter Huber | 2013-07-16 |
| 8435726 | Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus | Alexandra Pazidis, Alexander Hirnet, Herbert Fink, Dieter Schmerek | 2013-05-07 |
| 8049964 | Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element | Alexandra Pazidis | 2011-11-01 |
| 7659976 | Devices and methods for inspecting optical elements with a view to contamination | Julian Kaller, Herbert Fink, Wolfgang Rupp | 2010-02-09 |
| 7583443 | Reflective optical element for ultraviolet radiation, projection optical system and projection exposure system therewith, and method for forming the same | — | 2009-09-01 |
| 7518797 | Microlithographic exposure apparatus | Alexandra Pazidis | 2009-04-14 |
| 7460206 | Projection objective for immersion lithography | Patrick Scheible, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Michael Lill +5 more | 2008-12-02 |
| 7239447 | Objective with crystal lenses | Aksel Goehnermeier, Alexandra Pazidis, Birgit Kuerz, Daniel Kraehmer | 2007-07-03 |
| 7093937 | Optical component and coating system for coating substrates for optical components | Harry J. Bauer, Matthias Heller, Hans-Jochen Paul, Jens Ullmann, Patrick Scheible | 2006-08-22 |
| 6863398 | Method and coating system for coating substrates for optical components | Harry J. Bauer, Matthias Heller, Hans-Jochen Paul, Jens Ullmann, Patrick Scheible | 2005-03-08 |
| 6842294 | Catadioptric objective | Hubert Holderer, Ulrich Weber, Alexander Kohl, Toralf Gruner, Jens Ullmann +3 more | 2005-01-11 |