EL

Erik Loopstra

CG Carl Zeiss Smt Gmbh: 6 patents #232 of 1,189Top 20%
AL Asm Lithography: 1 patents #4 of 15Top 30%
AB Asml Netherlands B.V.: 1 patents #2,025 of 3,192Top 65%
U.S. Philips: 1 patents #4,133 of 8,851Top 50%
📍 Ederheim, DE: #3 of 4 inventorsTop 75%
Overall (All Time): #539,581 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
12372884 Device for positioning and holding at least one optical element, measurement system Thomas Groezinger, Semih Oeztuerk, Anton F. Haase 2025-07-29
12117731 Method for producing a mirror of a microlithographic projection exposure apparatus Christoph Zaczek, Eric Eva, Drew Chieda, Matthew Lipson, Victor Antonio PEREZ-FALCON +1 more 2024-10-15
10908508 Position measurement of optical elements in a lithographic apparatus Engelbertus Antonius Fransiscus Van Der Pasch, Sascha Bleidistel, Suzanne Cosijn 2021-02-02
10599051 Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus Stefan Hembacher, Jens Kugler, Bernhard Geuppert 2020-03-24
10509325 Position measurement of optical elements in a lithographic apparatus Engelbertus Antonius Fransiscus Van Der Pasch, Sascha Bleidistel, Suzanne Cosijn 2019-12-17
10481500 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type Hans-Juergen Mann, Wilhelm Ulrich, David Shafer 2019-11-19
6765712 Lithographic apparatus, device manufacturing method, and device manufactured thereby Antonius Johannes Josephus Van Dijsseldonk, Dominicus Jacobus Petrus Adrianus Franken 2004-07-20
6226075 Supporting device provided with a gas spring with a gas bearing, and lithographic device provided with such supporting devices Peter Heiland 2001-05-01
5767948 Lithographic device with a three-dimensionally positionable mask holder Frank Bernhard Sperling, Hendricus J.M. Meijer, Jan Van Eijk 1998-06-16