Issued Patents All Time
Showing 1–25 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10908508 | Position measurement of optical elements in a lithographic apparatus | Erik Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Suzanne Cosijn | 2021-02-02 |
| 10578976 | Catadioptric projection objective including a reflective optical component and a measuring device | Toralf Gruner, Christoph Zaczek, Ralf Mueller | 2020-03-03 |
| 10509325 | Position measurement of optical elements in a lithographic apparatus | Erik Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Suzanne Cosijn | 2019-12-17 |
| 10459351 | Device for transmitting electrical signals, and lithography apparatus | Jan Horn, Florian Bart, Markus Hauf | 2019-10-29 |
| 10185221 | Arrangement for actuating an element in a microlithographic projection exposure apparatus | Ulrich Schoenhoff, Juergen Fischer | 2019-01-22 |
| 10162267 | Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations | Toralf Gruner, Alexander Wolf, Joachim Hartjes, Markus Schwab, Markus Hauf | 2018-12-25 |
| 10162270 | Projection exposure apparatus comprising a measuring system for measuring an optical element | Joachim Hartjes, Toralf Gruner | 2018-12-25 |
| 10146137 | Catadioptric projection objective including a reflective optical component and a measuring device | Toralf Gruner, Christoph Zaczek, Ralf Mueller | 2018-12-04 |
| 10054786 | Correction of optical elements by correction light irradiated in a flat manner | Manfred Maul | 2018-08-21 |
| 10025200 | Optimum arrangement of actuator and sensor points on an optical element | Pascal Marsollek, Johannes Lippert, Jasper Wesselingh | 2018-07-17 |
| 10012911 | Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator | Michael Arnz, Toralf Gruner, Joachim Hartjes, Markus Schwab | 2018-07-03 |
| 9964673 | Optical system with aperture device having plurality of aperture elements | Benjamin Sigel | 2018-05-08 |
| 9841682 | Arrangement for actuating an element in a microlithographic projection exposure apparatus | Ulrich Schoenhoff, Juergen Fischer | 2017-12-12 |
| 9817322 | Optical imaging device and method for reducing dynamic fluctuations in pressure difference | Stefan Hembacher, Bernhard Gellrich, Jens Kugler | 2017-11-14 |
| 9581813 | Method for improving the imaging properties of a projection objective, and such a projection objective | Olaf Conradi, Heiko Feldmann, Gerald Richter, Andreas Frommeyer, Toralf Gruner +1 more | 2017-02-28 |
| 9568837 | Arrangement for actuating an element in a microlithographic projection exposure apparatus | Ulrich Schoenhoff, Juergen Fischer | 2017-02-14 |
| 9535336 | Microlithographic projection exposure apparatus | Yim-Bun Patrick Kwan, Florian Bach, Daniel Benz, Severin Waldis, Armin Werber | 2017-01-03 |
| 9366977 | Semiconductor microlithography projection exposure apparatus | Olaf Conradi, Arif Kazi | 2016-06-14 |
| 9366857 | Correction of optical elements by correction light irradiated in a flat manner | Manfred Maul | 2016-06-14 |
| 9164396 | Projection lens system of a microlithographic projection exposure installation | Helmut Beierl, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra +6 more | 2015-10-20 |
| 9110388 | Projection exposure apparatus with multiple sets of piezoelectric elements moveable in different directions and related method | Bernhard Geuppert | 2015-08-18 |
| 9069263 | Method for improving the imaging properties of a projection objective, and such a projection objective | Olaf Conradi, Heiko Feldmann, Gerald Richter, Andreas Frommeyer, Toralf Gruner +1 more | 2015-06-30 |
| 8811568 | Correction of optical elements by correction light irradiated in a flat manner | Manfred Maul | 2014-08-19 |
| 8786826 | Arrangement for actuating an element in a microlithographic projection exposure apparatus | Ulrich Schoenhoff, Juergen Fischer | 2014-07-22 |
| 8773638 | Microlithographic projection exposure apparatus with correction optical system that heats projection objective element | Aurelian Dodoc, Olaf Conradi, Arif Kazi | 2014-07-08 |