Issued Patents All Time
Showing 1–25 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11320314 | Method and device for determining the heating state of an optical element in an optical system for microlithography | Toralf Gruner, Joachim Hartjes, Gerhard Beurer | 2022-05-03 |
| 11187989 | Method for determining properties of an EUV source | Timo Laufer, Ulrich Mueller | 2021-11-30 |
| 10761317 | Device for swiveling a mirror element with two degrees of swiveling freedom | Yanko Sarov | 2020-09-01 |
| 10684551 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2020-06-16 |
| 10514276 | Sensor device | Ralf Ameling | 2019-12-24 |
| 10459351 | Device for transmitting electrical signals, and lithography apparatus | Jan Horn, Sascha Bleidistel, Florian Bart | 2019-10-29 |
| 10409167 | Method for illuminating an object field of a projection exposure system | Martin Endres, Johannes Eisenmenger, Stig Bieling, Lars Wischmeier, Fabian Haacker | 2019-09-10 |
| 10317802 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2019-06-11 |
| 10303065 | Arrangement for actuating at least one optical element in an optical system | Alexander Vogler | 2019-05-28 |
| 10162267 | Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations | Toralf Gruner, Sascha Bleidistel, Alexander Wolf, Joachim Hartjes, Markus Schwab | 2018-12-25 |
| 10108097 | Arrangement for manipulating the position of an element | Ulrich Schoenhoff, Eylem Bektas | 2018-10-23 |
| 10101507 | Mirror device | Yanko Sarov, Markus Holz, Fabian Haacker, Mark Christof Wengler | 2018-10-16 |
| 10031423 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2018-07-24 |
| 9887613 | Lithography device with eddy-current brake | Alexander Vogler | 2018-02-06 |
| 9874819 | Mirror array | Stig Bieling, Lars Wischmeier, Fabian Haacker, Martin Endres, Johannes Eisenmenger | 2018-01-23 |
| 9846370 | Support apparatus for an optical device, optical device and lithography system | Henner Baitinger | 2017-12-19 |
| 9798254 | Arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus | — | 2017-10-24 |
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2017-08-29 |
| 9665011 | Arrangement for actuating at least one optical element in an optical system | Alexander Vogler | 2017-05-30 |
| 9651772 | Arrangement for the actuation of at least one element in an optical system | Martin Latzel, Edwin Johan Buis | 2017-05-16 |
| 9593733 | Damping arrangement for dissipating oscillating energy of an element in a system, more particularly in a microlithographic projection exposure apparatus | — | 2017-03-14 |
| 9581912 | Model-based control of an optical imaging device | Gerald Rothenhoefer | 2017-02-28 |
| 9448490 | EUV lithography system | Udo Dinger, Lars Wischmeier, Stephan Kellner, Igor Gurevich, Markus Deguenther | 2016-09-20 |
| 9442397 | Device for controlling temperature of an optical element | — | 2016-09-13 |
| 9316929 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2016-04-19 |