Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11720028 | Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography | Thomas Fischer, Michael Patra, Hubert Holderer | 2023-08-08 |
| 10409167 | Method for illuminating an object field of a projection exposure system | Martin Endres, Johannes Eisenmenger, Stig Bieling, Markus Hauf, Fabian Haacker | 2019-09-10 |
| 9874819 | Mirror array | Stig Bieling, Markus Hauf, Fabian Haacker, Martin Endres, Johannes Eisenmenger | 2018-01-23 |
| 9448490 | EUV lithography system | Udo Dinger, Markus Hauf, Stephan Kellner, Igor Gurevich, Markus Deguenther | 2016-09-20 |