Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12345817 | Method for operating a LIDAR system | Frank Holler, Thomas Wollweber, Peter Westphal | 2025-07-01 |
| 12276917 | Mirror, in particular for microlithography | Mohammad Awad, Kerstin Hild | 2025-04-15 |
| 11747473 | Apparatus and method for ascertaining a distance to an object | — | 2023-09-05 |
| 11504855 | System, method and marker for the determination of the position of a movable object in space | Nils Haverkamp, Marc Schneider, Tanja Teuber, Lars Omlor | 2022-11-22 |
| 11402760 | Optical arrangement and lithography apparatus | Stefan Richter | 2022-08-02 |
| 11262660 | Image sensor, position sensor device, lithography system, and method for operating an image sensor | Ulrich Bihr, Andy Zott, Markus Deguenther | 2022-03-01 |
| 11239054 | Multi-beam particle beam system | Yanko Sarov, Ulrich Bihr, Christof Riedesel, Erik Essers | 2022-02-01 |
| 10854423 | Multi-beam particle beam system | Yanko Sarov, Ulrich Bihr, Christof Riedesel, Erik Essers | 2020-12-01 |
| 10678151 | Control device | Markus Holz, Klaus Syrowatka | 2020-06-09 |
| 10514619 | Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system | Ulrich Bihr, Markus Holz | 2019-12-24 |
| 10459351 | Device for transmitting electrical signals, and lithography apparatus | Sascha Bleidistel, Florian Bart, Markus Hauf | 2019-10-29 |
| 10444633 | Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system | Stefan Krone, Lars Berger | 2019-10-15 |
| 10437155 | Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system | Stefan Krone, Lars Berger | 2019-10-08 |
| 10139618 | Multi-mirror array | Stefan Tuerk, Oscar Franciscus Jozephus Noordman, Ulrich Bihr | 2018-11-27 |
| 10061202 | Methods and devices for driving micromirrors | Christian Kempter | 2018-08-28 |
| 10018803 | Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangement | Markus Holz, Joerg Specht, Johannes Eisenmenger, Stefan Krone | 2018-07-10 |
| 10007195 | Device for determining a tilt angle of at least one mirror of a lithography system, and method | Markus Holz, Joerg Specht | 2018-06-26 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2018-02-20 |
| 9851555 | Optical component | Markus Holz, Benjamin Sigel, Benedikt Knauf, Fabian Haacker | 2017-12-26 |
| 9599788 | Optical module | Benedikt Knauf | 2017-03-21 |
| 9348232 | Illumination system for a microlithographic projection exposure apparatus | Christian Kempter, Wolfgang Fallot-Burghardt | 2016-05-24 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2016-01-19 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-28 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-21 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-07 |