Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9164396 | Projection lens system of a microlithographic projection exposure installation | Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra +6 more | 2015-10-20 |
| 9146475 | Projection exposure system and projection exposure method | Paul Graupner, Olaf Conradi, Christoph Zaczek, Wilhelm Ulrich, Toralf Gruner +1 more | 2015-09-29 |
| 8982325 | Microlithographic projection exposure apparatus | Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Heiko Feldmann, Hans-Juergen Mann +1 more | 2015-03-17 |
| 8436982 | Projection objective for microlithography | Heiko Feldmann, Jochen Hetzler, Michael Totzeck | 2013-05-07 |
| 8319944 | Projection lens system of a microlithographic projection exposure installation | Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra +6 more | 2012-11-27 |
| 8107054 | Microlithographic projection exposure apparatus | Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Heiko Feldmann, Hans-Juergen Mann +1 more | 2012-01-31 |
| 7782440 | Projection lens system of a microlithographic projection exposure installation | Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra +6 more | 2010-08-24 |
| 7426082 | Catadioptric projection objective with geometric beam splitting | David Shafer, Alexander Epple, Aurelian Dodoc, Wilhelm Ulrich | 2008-09-16 |
| 7408716 | Refractive projection objective for immersion lithography | Hans-Juergen Rostalski, Aurelian Dodoc, Alexander Epple | 2008-08-05 |
| 7187503 | Refractive projection objective for immersion lithography | Hans-Juergen Rostalski, Aurelian Dodoc, Alexander Epple | 2007-03-06 |
| 7154678 | Projection objective having adjacently mounted aspheric lens surfaces | Karl-Heinz Schuster, David Shafer, Wilhelm Ulrich, Wolfgang Singer | 2006-12-26 |
| 7136220 | Catadioptric reduction lens | Wilhelm Ulrich, David Shafer, Alexander Epple, Aurelian Dodoc | 2006-11-14 |
| 7006304 | Catadioptric reduction lens | Alexander Epple | 2006-02-28 |
| 6995930 | Catadioptric projection objective with geometric beam splitting | David Shafer, Alexander Epple, Aurelian Dodoc, Wilhelm Ulrich | 2006-02-07 |
| 6985286 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Gerhard Furter, Karl-Heinz Schuster, Wilhelm Ulrich | 2006-01-10 |
| 6903802 | Projection objective having adjacently mounted aspheric lens surfaces | Karl-Heinz Schuster, David Shafer, Wilhelm Ulrich, Wolfgang Singer | 2005-06-07 |
| 6806942 | Projection exposure system | Karl-Heinz Schuster, Wilhelm Ulrich, Toralf Gruner, Daniel Kraehmer, Wolfgang Singer +2 more | 2004-10-19 |
| 6717746 | Catadioptric reduction lens | Alexander Epple | 2004-04-06 |
| 6717722 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Gerhard Furter, Karl-Heinz Schuster, Wilhelm Ulrich | 2004-04-06 |
| 6665126 | Projection exposure lens with aspheric elements | David Shafer, Wilhelm Ulrich | 2003-12-16 |
| 6646718 | Projection objective having adjacently mounted aspheric lens surfaces | Karl-Heinz Schuster, David Shafer, Wilhelm Ulrich, Wolfgang Singer | 2003-11-11 |
| 6496306 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Gerhard Furter, Karl-Heinz Schuster, Wilhelm Ulrich | 2002-12-17 |
| 6424471 | Catadioptric objective with physical beam splitter | Willi Ulrich | 2002-07-23 |
| 6349005 | Microlithographic reduction objective, projection exposure equipment and process | Karl-Heinz Schuster | 2002-02-19 |