SW

Severin Waldis

CG Carl Zeiss Smt Gmbh: 12 patents #117 of 1,189Top 10%
Overall (All Time): #416,548 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
10078271 Optical component Matthias Orth, Roger Marc Bostock, Jian Deng, Sebastian Lani, Benedikt Knauf +1 more 2018-09-18
9946161 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method Ingo Saenger, Ralf Scharnweber, Olaf Dittmann, Toralf Gruner, Gundula Weiss +5 more 2018-04-17
9804501 Optical component Marco Jassmann, Caglar Ataman, Roger Marc Bostock, Jian Deng, Sebastian Lani +1 more 2017-10-31
9791691 Mirror array Sebastian Lani, Benedikt Knauf, Jian Deng, Roger Marc Bostock 2017-10-17
9535336 Microlithographic projection exposure apparatus Sascha Bleidistel, Yim-Bun Patrick Kwan, Florian Bach, Daniel Benz, Armin Werber 2017-01-03
9523922 Illumination system of a microlithographic projection exposure apparatus having a temperature control device Florian Bach, Daniel Benz, Armin Werber, Berndt Warm 2016-12-20
9274434 Light modulator and illumination system of a microlithographic projection exposure apparatus Armin Werber, Florian Bach 2016-03-01
9116440 Optical module for guiding a radiation beam Markus Hauf, Wilfried Noell, Yves Petremend, Marco Jassmann, Lothar Kulzer +1 more 2015-08-25
8797507 Illumination system of a microlithographic projection exposure apparatus having a temperature control device Florian Bach, Daniel Benz, Armin Werber, Berndt Warm 2014-08-05
8767176 Microlithographic projection exposure apparatus Sascha Bleidistel, Yim-Bun Patrick Kwan, Florian Bach, Daniel Benz, Armin Werber 2014-07-01
8717531 Mirror for guiding a radiation bundle Florian Bach, Daniel Benz, Armin Werber, Wilfried Noell, Dirk Heinrich Ehm +2 more 2014-05-06
8587767 Illumination optics for EUV microlithography and related system and apparatus Damian Fiolka, Berndt Warm, Christian Steigerwald, Martin Endres, Ralf Stuetzle +6 more 2013-11-19