Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9946161 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Ingo Saenger, Ralf Scharnweber, Toralf Gruner, Gundula Weiss, Andras G. Major +5 more | 2018-04-17 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Frank Schlesener, Ingo Saenger, Aksel Goehnermeier, Alexandra Pazidis, Thomas Schicketanz +2 more | 2017-02-28 |
| 9323156 | Optical system of a microlithographic projection exposure apparatus | Ingo Saenger, Joerg Zimmermann | 2016-04-26 |
| 9170499 | Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element | Damian Fiolka, Manfred Maul, Markus Schwab, Wolfgang Seitz | 2015-10-27 |
| 8928859 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka, Manfred Maul, Markus Schwab, Wolfgang Seitz | 2015-01-06 |
| 8854606 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Hans-Jurgen Mann, Wolfgang Singer, Toralf Gruner, Michael Totzeck | 2014-10-07 |
| 8325426 | Projection objective of a microlithographic projection exposure apparatus | Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss +2 more | 2012-12-04 |
| 8264668 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka, Manfred Maul, Markus Schwab, Wolfgang Seitz | 2012-09-11 |
| 7982854 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Hans-Juergen Mann, Wolfgang Singer, Toralf Gruner, Michael Totzeck | 2011-07-19 |
| 7982969 | Projection objective of a microlithographic projection exposure apparatus | Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss +2 more | 2011-07-19 |
| 7961297 | Method for determining intensity distribution in the image plane of a projection exposure arrangement | Joern Greif-Wuestenbecker, Beate Boehme, Ulrich Stroessner, Michael Totzeck, Vladimir Kamenov +3 more | 2011-06-14 |
| 7808615 | Projection exposure apparatus and method for operating the same | Toralf Gruner, Olaf Conradi, Nils Dieckmann, Markus Schwab, Michael Totzeck +2 more | 2010-10-05 |
| 7728975 | Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus | Michael Totzeck, Heiko Feldmann, Daniel Kraehmer | 2010-06-01 |
| 7474469 | Arrangement of optical elements in a microlithographic projection exposure apparatus | Michael Totzeck, Gerhart Fuerter, Karl-Heinz Schuster, David Shafer, Susanne Beder +1 more | 2009-01-06 |