Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11927500 | Method and device for characterizing the surface shape of an optical element | Steffen SIEGLER, Johannes Ruoff, Alexander Wolf, Michael Carl, Toralf Gruner | 2024-03-12 |
| 11326872 | Method and device for characterizing the surface shape of an optical element | Steffen SIEGLER | 2022-05-10 |
| 10545323 | Projection optical unit for EUV projection lithography | Markus Schwab, Hartmut Enkisch | 2020-01-28 |
| 10520827 | Optical system, in particular for a microlithographic projection exposure apparatus | Hartmut Enkisch, Matus Kalisky, Oliver Dier | 2019-12-31 |
| 10474036 | Optical element and optical arrangement therewith | Hans-Jochen Paul, Boris Bittner, Norbert Wabra | 2019-11-12 |
| 10203435 | EUV mirror and optical system comprising EUV mirror | Oliver Dier, Sebastian Strobel, Ralf Winter | 2019-02-12 |
| 10120176 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Toralf Gruner | 2018-11-06 |
| 10042146 | Catadioptric projection objective | Alexander Epple, Vladimir Kamenov, Toralf Gruner | 2018-08-07 |
| 10001631 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner +6 more | 2018-06-19 |
| 9915873 | Reflective optical element, and optical system of a microlithographic projection exposure apparatus | Hartmut Enkisch, Hans-Jochen Paul, Oliver Dier, Joern WEBER, Christian Grasse +2 more | 2018-03-13 |
| 9915876 | EUV mirror and optical system comprising EUV mirror | Hans-Jochen Paul, Christoph Zaczek | 2018-03-13 |
| 9817220 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Toralf Gruner | 2017-11-14 |
| 9726870 | Catadioptric projection objective | Alexander Epple, Vladimir Kamenov, Toralf Gruner | 2017-08-08 |
| 9639005 | Imaging catoptric EUV projection optical unit | Johannes Ruoff | 2017-05-02 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Frank Schlesener, Ingo Saenger, Olaf Dittmann, Aksel Goehnermeier, Alexandra Pazidis +2 more | 2017-02-28 |
| 9459435 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Toralf Gruner | 2016-10-04 |
| 9341756 | Method for correcting the surface form of a mirror | Juergen Mueller, Dirk Heinrich Ehm | 2016-05-17 |
| 9291751 | Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit | Hans-Juergen Rostalski, Sascha Migura | 2016-03-22 |
| 9279969 | Catadioptric projection objective | Alexander Epple, Vladimir Kamenov, Toralf Gruner | 2016-03-08 |
| 9274327 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Toralf Gruner | 2016-03-01 |
| 8902406 | Projection objective | Reinhold Walser | 2014-12-02 |
| 8896814 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Toralf Gruner | 2014-11-25 |
| 8873137 | Catadioptric projection objective | Alexander Epple, Vladimir Kamenov, Toralf Gruner | 2014-10-28 |
| 8693098 | Projection objective for a microlithographic EUV projection exposure apparatus | Siegfried Rennon, Hans-Juergen Mann | 2014-04-08 |
| 8446665 | Catadioptric projection objective | Alexander Epple, Vladimir Kamenov, Toralf Gruner | 2013-05-21 |