Issued Patents All Time
Showing 26–50 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8395753 | Microlithographic projection exposure apparatus | Damian Fiolka, Alexandra Pazidis, Michael Ricker | 2013-03-12 |
| 8369605 | Method and apparatus for determining the position of a structure on a carrier relative to a reference point of the carrier | Michael Arnz, Gerd Klose | 2013-02-05 |
| 8339574 | Lithographic apparatus and device manufacturing method | Bernd Geh, Skip Miller | 2012-12-25 |
| 8325426 | Projection objective of a microlithographic projection exposure apparatus | Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Wilfried Clauss, Susanne Beder +2 more | 2012-12-04 |
| 8305558 | Illumination system for a microlithography projection exposure apparatus | Toralf Gruner | 2012-11-06 |
| 8294991 | Interference systems for microlithgraphic projection exposure systems | Ralf Mueller, Toralf Gruner, Heiko Feldmann, Hans-Jochen Paul | 2012-10-23 |
| 8237918 | Optical system of a microlithographic projection exposure apparatus | Toralf Gruner, Damian Fiolka | 2012-08-07 |
| 8169595 | Optical apparatus and method for modifying the imaging behavior of such apparatus | Martin Schriever, Ulrich Wegmann, Stefan Hembacher, Bernhard Geuppert, Juergen Huber +2 more | 2012-05-01 |
| 8126669 | Optimization and matching of optical systems by use of orientation Zernike polynomials | Daniel Kraehmer, Ralf Mueller, Johannes Ruoff, Vladan Blahnik | 2012-02-28 |
| 8107054 | Microlithographic projection exposure apparatus | Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann +1 more | 2012-01-31 |
| 8031326 | Illumination system or projection lens of a microlithographic exposure system | Susanne Beder, Wilfried Clauss, Heiko Feldmann, Daniel Kraehmer, Aurelian Dodoc | 2011-10-04 |
| 7982854 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Hans-Juergen Mann, Wolfgang Singer, Toralf Gruner, Olaf Dittmann | 2011-07-19 |
| 7982969 | Projection objective of a microlithographic projection exposure apparatus | Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Wilfried Clauss, Susanne Beder +2 more | 2011-07-19 |
| 7961297 | Method for determining intensity distribution in the image plane of a projection exposure arrangement | Joern Greif-Wuestenbecker, Beate Boehme, Ulrich Stroessner, Vladimir Kamenov, Olaf Dittmann +3 more | 2011-06-14 |
| 7924436 | Method for approximating an influence of an optical system on the state of polarization of optical radiation | Markus Mengel | 2011-04-12 |
| 7847921 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Daniel Kraehmer, Johannes Wangler, Markus Brotsack, Nils Dieckmann +4 more | 2010-12-07 |
| 7817250 | Microlithographic projection exposure apparatus | Damian Fiolka, Alexandra Pazidis, Michael Ricker | 2010-10-19 |
| 7808615 | Projection exposure apparatus and method for operating the same | Toralf Gruner, Olaf Conradi, Nils Dieckmann, Markus Schwab, Olaf Dittmann +2 more | 2010-10-05 |
| 7728975 | Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus | Heiko Feldmann, Daniel Kraehmer, Olaf Dittmann | 2010-06-01 |
| 7535640 | Imaging system for emulation of a high aperture scanning system | Ulrich Stroessner, Joern Greif-Wuestenbecker | 2009-05-19 |
| 7474469 | Arrangement of optical elements in a microlithographic projection exposure apparatus | Gerhart Fuerter, Olaf Dittmann, Karl-Heinz Schuster, David Shafer, Susanne Beder +1 more | 2009-01-06 |
| 7463422 | Projection exposure apparatus | Vladimir Kamenow, Daniel Kraehmer, Toralf Gruner, Aurelian Dodoc, David Shafer +4 more | 2008-12-09 |
| 7423727 | Lithographic apparatus and device manufacturing method | Bernd Geh, Skip Miller | 2008-09-09 |
| 7411656 | Optically polarizing retardation arrangement, and a microlithography projection exposure machine | Birgit Enkisch, Karl-Heinz Schuster | 2008-08-12 |
| 7408616 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Daniel Kraehmer, Johannes Wangler, Markus Brotsack, Nils Dieckmann +4 more | 2008-08-05 |