MT

Michael Totzeck

CG Carl Zeiss Smt Gmbh: 39 patents #26 of 1,189Top 3%
CS Carl Zeiss Sms: 7 patents #5 of 118Top 5%
CG Carl Zeiss Vision International Gmbh: 4 patents #33 of 185Top 20%
CG Carl Zeiss Industrielle Messtechnik Gmbh: 4 patents #25 of 238Top 15%
AB Asml Netherlands B.V.: 2 patents #1,484 of 3,192Top 50%
CG Carl Zeiss Microscopy Gmbh: 2 patents #199 of 564Top 40%
CA Carl Zeiss Meditec Ag: 1 patents #393 of 667Top 60%
CM Carl Zeiss Industrial Metrology: 1 patents #8 of 23Top 35%
CA Carl Zeiss Ag: 1 patents #120 of 312Top 40%
📍 Hinterhochstett, DE: #1 of 18 inventorsTop 6%
Overall (All Time): #42,669 of 4,157,543Top 2%
57
Patents All Time

Issued Patents All Time

Showing 51–57 of 57 patents

Patent #TitleCo-InventorsDate
7405808 Optical system, in particular illumination system, of a microlithographic projection exposure apparatus Toralf Gruner, Damian Fiolka, Wilhelm Ulrich, Gerhard Fuerter 2008-07-29
7321465 Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses Vladimir Kamenov, Toralf Gruner 2008-01-22
7286284 Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection Heiko Feldmann, Toralf Gruner, Karl-Heinz Schuster, Joern Greif-Wuestenbecker, Thomas Scheruebl +3 more 2007-10-23
7286245 Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser Ulrich Wegmann, Michael Hartl, Markus Mengel, Manfred Dahl, Helmut Haidner +1 more 2007-10-23
7239450 Method of determining lens materials for a projection exposure apparatus Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Aurelian Dodoc 2007-07-03
7053988 Optically polarizing retardation arrangement, and microlithography projection exposure machine Birgit Enkisch, Karl-Heinz Schuster 2006-05-30
6992834 Objective with birefringent lenses Vladimer Kamenov, Daniel Kraehmer, Wilhelm Ulrich 2006-01-31