| 10504681 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +2 more |
2019-12-10 |
| 9673024 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +2 more |
2017-06-06 |
| 9224576 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +2 more |
2015-12-29 |
| 8637834 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximillian Haider +2 more |
2014-01-28 |
| 8268516 |
Method for repairing phase shift masks |
Axel Zibold, Peter Kuschnerus |
2012-09-18 |
| 8264535 |
Method and apparatus for analyzing a group of photolithographic masks |
Rigo Richter, Norbert Rosenkranz, Yuji Kobiyama, Thomas Scheruebl |
2012-09-11 |
| 8097847 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +1 more |
2012-01-17 |
| 7916930 |
Method and arrangement for repairing photolithography masks |
Axel Zibold, Wolfgang Harnisch |
2011-03-29 |
| 7554094 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +1 more |
2009-06-30 |
| 7244949 |
Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
Rainer Knippelmeyer |
2007-07-17 |
| 7135677 |
Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system |
Rainer Knippelmeyer, Stephan Uhlemann, Max Haider, Heiko Müller |
2006-11-14 |
| 7015487 |
Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose |
Alexander Orchowski |
2006-03-21 |
| 6967328 |
Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor |
Rainer Knippelmeyer, Ingo Muller |
2005-11-22 |
| 6946657 |
Electron microscopy system |
Rainer Knippelmeyer, Heiko Müller |
2005-09-20 |
| 6914249 |
Particle-optical apparatus, electron microscopy system and electron lithography system |
Rainer Knippelmeyer |
2005-07-05 |
| 6903337 |
Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same |
Dirk Stenkamp, Michael Steigerwald, Rainer Knippelmeyer, Max Haider, Heiko Müller +1 more |
2005-06-07 |
| 6878936 |
Applications operating with beams of charged particles |
Rainer Knippelmeyer |
2005-04-12 |
| 6756599 |
Particle-optical apparatus, illumination apparatus and projection system as well as a method employing the same |
— |
2004-06-29 |
| 6642525 |
Particle-optical component and system comprising a particle-optical component |
Holger Weigand |
2003-11-04 |
