Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10504681 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements | Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +2 more | 2019-12-10 |
| 9673024 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements | Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +2 more | 2017-06-06 |
| 9224576 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements | Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +2 more | 2015-12-29 |
| 8637834 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements | Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximillian Haider +2 more | 2014-01-28 |
| 8268516 | Method for repairing phase shift masks | Axel Zibold, Peter Kuschnerus | 2012-09-18 |
| 8264535 | Method and apparatus for analyzing a group of photolithographic masks | Rigo Richter, Norbert Rosenkranz, Yuji Kobiyama, Thomas Scheruebl | 2012-09-11 |
| 8097847 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements | Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +1 more | 2012-01-17 |
| 7916930 | Method and arrangement for repairing photolithography masks | Axel Zibold, Wolfgang Harnisch | 2011-03-29 |
| 7554094 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements | Rainer Knippelmeyer, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider +1 more | 2009-06-30 |
| 7244949 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements | Rainer Knippelmeyer | 2007-07-17 |
| 7135677 | Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system | Rainer Knippelmeyer, Stephan Uhlemann, Max Haider, Heiko Müller | 2006-11-14 |
| 7015487 | Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose | Alexander Orchowski | 2006-03-21 |
| 6967328 | Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor | Rainer Knippelmeyer, Ingo Muller | 2005-11-22 |
| 6946657 | Electron microscopy system | Rainer Knippelmeyer, Heiko Müller | 2005-09-20 |
| 6914249 | Particle-optical apparatus, electron microscopy system and electron lithography system | Rainer Knippelmeyer | 2005-07-05 |
| 6903337 | Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same | Dirk Stenkamp, Michael Steigerwald, Rainer Knippelmeyer, Max Haider, Heiko Müller +1 more | 2005-06-07 |
| 6878936 | Applications operating with beams of charged particles | Rainer Knippelmeyer | 2005-04-12 |
| 6756599 | Particle-optical apparatus, illumination apparatus and projection system as well as a method employing the same | — | 2004-06-29 |
| 6642525 | Particle-optical component and system comprising a particle-optical component | Holger Weigand | 2003-11-04 |