Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system

Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system

US Patent 7135677 · Granted Nov 14, 2006

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Drug delivery device2024
Temperature-controlled centrifuge with protective gas release in case of rotor c2023
Objective lens arrangement usable in particle-optical systems2022
Field curvature correction for multi-beam inspection systems2022
Method and system for charged particle microscopy with improved image beam stabi2021
Particle-optical corrector which is free from axial aberrations of sixth order a2021
Method and system for focus adjustment of a multi-beam scanning electron microsc2020
Method and system for charged particle microscopy with improved image beam stabi2020
Objective lens arrangement usable in particle-optical systems2020
Assembly for a drug delivery device and drug delivery device2020
Charged particle beam system and method of operating the same2020
Particle-optical systems and arrangements and particle-optical components for su2019