Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10859815 | Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective | — | 2020-12-08 |
| 10684551 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2020-06-16 |
| 10317802 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2019-06-11 |
| 10054860 | Projection exposure apparatus with optimized adjustment possibility | Boris Bittner, Matthias Roesch | 2018-08-21 |
| 10031423 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2018-07-24 |
| 9760019 | Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus | Boris Bittner | 2017-09-12 |
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2017-08-29 |
| 9720336 | Microlithographic apparatus and method of varying a light irradiance distribution | Alexander Wolf | 2017-08-01 |
| 9354524 | Projection exposure apparatus with optimized adjustment possibility | Boris Bittner, Matthias Roesch | 2016-05-31 |
| 9316929 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2016-04-19 |
| 9207541 | Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus | Markus Hauf, Norman Baer, Joachim Hartjes | 2015-12-08 |
| 9164402 | Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus | Boris Bittner | 2015-10-20 |
| 9081310 | Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same | Matthias Exler, Ulrich Loering, Toralf Gruner | 2015-07-14 |
| 9052609 | Projection exposure apparatus with optimized adjustment possibility | Boris Bittner, Matthias Roesch | 2015-06-09 |
| 8203696 | Projection exposure apparatus with optimized adjustment possibility | Boris Bittner, Matthias Roesch | 2012-06-19 |
| 7697211 | Symmetrical objective having four lens groups for microlithography | David Shafer, Aurelian Dodoc, Johannes Zellner, Heiko Feldmann, Wilhelm Ulrich +3 more | 2010-04-13 |
| 5716590 | Catalytic hydrodehalogenation of halogen-containing compounds of group IV elements | Gerhard Roewer, Uwe Paetzold | 1998-02-10 |