Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8717531 | Mirror for guiding a radiation bundle | Severin Waldis, Florian Bach, Daniel Benz, Armin Werber, Wilfried Noell +2 more | 2014-05-06 |
| 8698999 | Protection module for EUV lithography apparatus, and EUV lithography apparatus | Timo Laufer, Ben Banney, Jens Kugler, Ulrich Nieken, Franz Keller | 2014-04-15 |
| 8585224 | Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination | Stephan Muellender, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus +2 more | 2013-11-19 |
| 8553200 | Optical element with at least one electrically conductive region, and illumination system with the optical element | Bastiaan Theodoor Wolschrijn, Berndt Warm | 2013-10-08 |
| 8546776 | Optical system for EUV lithography with a charged-particle source | Markus Weiss, Christoph Zaczek, Tobias Hackl, Wolfgang Seitz | 2013-10-01 |
| 8477285 | Particle cleaning of optical elements for microlithography | Arnoldus Jan Storm, Johannes Hubertus Josephina Moors, Almut Czap, Mona Nagel, Jacques Cor Johan Van Der Donck +4 more | 2013-07-02 |
| 8419862 | Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor | Arnold Storm, Johannes Josephina Moors, Bastiaan Theodoor Wolschrijn, Thomas Stein, Edwin te Sligte | 2013-04-16 |
| 8382301 | Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination | Stephan Muellender, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus +2 more | 2013-02-26 |
| 8339576 | Projection objective of a microlithographic projection exposure apparatus | Ulrich Loering, Vladimir Kamenov, Stefan Schmidt, Moritz Becker, Andreas Wurmbrand | 2012-12-25 |
| 8279397 | Method for removing contamination on optical surfaces and optical arrangement | Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Vadim Yevgenyevich Banine, Vladimir Vitalevitsch Ivanov | 2012-10-02 |
| 8054446 | EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surface | Dieter Kraus, Stefan Schmidt | 2011-11-08 |
| 7959310 | Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element | Annemieke Van De Runstraat, Bastiaan Theodoor Wolschrijn, Arnoldus Jan Storm, Thomas Stein, Marco G. H. Meijerink +8 more | 2011-06-14 |
| 7911598 | Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device | Dieter Kraus, Thomas Stein, Harald Woelfle, Stefan Schmidt | 2011-03-22 |
| 7763870 | Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements | Hermann Bieg, Hans-Juergen Mann, Stephan Muellender, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn | 2010-07-27 |
| 7671347 | Cleaning method, apparatus and cleaning system | Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Marcus Gerhardus Hendrikus Meijerink, Thomas Stein | 2010-03-02 |